Multi-feed RF distribution systems and methods

• US 8,344,559 B2
• Filed: 05/05/2009
• Issued: 01/01/2013
• Est. Priority Date: 05/05/2009
• Status: Active Grant

• Current Assignee: AES Global Holdings Pte Ltd. (Advanced Energy Industries, Inc. (China))
• Original Assignee: Advanced Energy Industries Incorporated
• Inventors: Van Zyl, Gideon, Gonzales, Juan Jose
• Primary Examiner(s): KAPLAN, HAL IRA
• Application Number:
  US12/435,526
• Publication Number:
  US 20100283395A1
• Time in Patent Office: 1,337 Days
• Field of Search: 307/157
• US Class Current: 307/157
• CPC Class Codes: H01J 37/32082 Radio frequency generated discharge H01J37/32357, H01J37/32366, H01J37/32394 and H01J37/32403 take precedence
• CPC Class Codes: H01J 37/32174 Circuits specially adapted for controlling the RF discharge
• CPC Class Codes: H03H 7/40 Automatic matching of load impedance to source impedance
• CPC Class Codes: H05B 41/245 for a plurality of lamps
• CPC Class Codes: H05H 1/46 using applied electromagnetic fields, e.g. high frequency or microwave energy H05H1/26 takes precedence

Abstract

Improved power distribution architectures for the uniform delivery of single frequency RF power to plasma chambers are disclosed. The architectures include feeding into multiple points across a single large-area electrode, multiple electrodes driving a common plasma discharge as well as multiple coils driving a common plasma discharge. The time-averaged electromagnetic field distribution may be controlled using an array of generator and match (delivery) systems, one of which may be capable of absorbing net power and presenting controlled impedance to the plasma load. In variations, an M+N port network (with M the number of generators and N the number of feed points on the electrode) may be implemented to level the power required from each generator while maintaining a desired field strength distribution.

Claims

1. A method of powering an electrode system driving a plasma chamber, the method comprising:

coupling M power generators to N feed points on an electrode system,

absorbing power at K of the N feed points, where 0<

K<

N, and

delivering power at the other N−

K feed points;

controlling an impedance presented to the K feed points and controlling the phase and amplitude of delivered power at the other N−

K feed points; and

converting the power absorbed at one of the K feed points into power useable by one of the N−

K feed points;

wherein the M power generators are coupled to the N feed points on an electrode system via a M+N port network such that the total power delivered to the N feed points is equal to the total power taken from the M generators except for losses in the M+N port network;

wherein the power delivered by each of the M generators are equal.

2. The method of claim 1, including measuring the impedance presented to the K feed points and adjusting variable elements in the M+N port network to adjust the measured impedance to a desired value.

3. The method of claim 2, wherein the M power generators generate power selected from the group of RF power and VHF power.

4. The method of claim 1, including converting the power absorbed at one of the K feed points into power useable by one of the N−

K feed points.

6. The method of claim 4,

including converting the power absorbed at one of the K feed points into power useable by one of the N−

K feed points.

5. A method of powering an electrode system driving a plasma chamber, the method comprising:

coupling M power generators to N feed points on an electrode system,

absorbing power at K of the N feed points, where 0<

K<

N, and

delivering power at the other N−

K feed points

wherein at least one of the power generators is capable of absorbing power at least equal to the power delivery capability of the generator.

7. The power distribution system of claim 5, wherein M is not equal to N.

8. A power distribution system comprising:

a number, M, of generators connected to a number, N, of feed points on an electrode system, the generators comprising a first generator capable of absorbing power from a point on an electrode, and

a first impedance matching network coupled to the first generator, the first impedance matching network presenting a controlled impedance to the point on the electrode when the first generator is absorbing power from the point on the electrode;

wherein the first impedance matching network is coupled to all of the M generators and comprises N ports capable of coupling the first impedance matching network to N points on the electrode;

wherein the first impedance matching network delivers power to a first subset of the N points on the electrode and absorbs power from a second subset of the N points on the electrode.

9. A power distribution system comprising:

a number, M, of generators connected to a number, N, of feed points on an electrode system, the generators comprising a first generator capable of absorbing power from a point on an electrode, and

a first impedance matching network coupled to the first generator, the first impedance matching network presenting a controlled impedance to the point on the electrode when the first generator is absorbing power from the point on the electrode; and

a common bus for recovering power absorbed at one generator and delivering a portion of that absorbed power to another generator.

10. A power distribution system comprising:

a number, M, of generators, and

an M+N port network coupled to all of the M generators, and comprising N ports capable of coupling the M+N port network to N points on one or more electrodes, the M+N port network being capable of absorbing power from at least one of the N points on the one or more electrodes

wherein the M+N port network transfers absorbed power from one of the N points to another one of the N points delivering power to the one or more electrodes.

11. The power distribution system of claim 10, wherein all of the M generators deliver positive net power to the M+N port network.

12. A power distribution system comprising:

a common driver amplifier,

a first amplitude and phase adjustment circuit,

a first power amplifier, and

a first impedance matching network coupled to the first power amplifier or the first amplitude and phase adjustment circuit, and a feed point on an electrode, the first power amplifier or the first impedance matching network being capable of absorbing power from the feed point on the electrode.

13. The power distribution system of claim 12, further comprising:

a power divider,

a second amplitude and phase adjustment circuit,

a second power amplifier, and

a second impedance matching network coupled to the second power amplifier or the second amplitude and phase adjustment circuit, and a second feed point on an electrode.

14. A method of powering an electrode system driving a plasma chamber, the method comprising:

coupling N−

L power generators and L dissipative loads to N feed points on an electrode system with N 2-port impedance matching networks,

absorbing power at K of the N feed points, including feedpoints where loads are connected where 0<

L K<

N, and

delivering power at the other N−

K feed points.

15. The method of claim 14, including controlling an impedance presented to the K feed points and controlling the phase and amplitude of delivered power at the other N−

K feed points.