Method for manufacturing a perpendicular magnetic write head having a leading edge tapered write pole, self aligned side shield and independent trailing shield

• US 8,347,489 B2
• Filed: 09/01/2010
• Issued: 01/08/2013
• Est. Priority Date: 09/01/2010
• Status: Active Grant

• Current Assignee: Western Digital Technologies Incorporated (Western Digital Corporation)
• Original Assignee: Hitachi Global Storage Technologies Netherlands BV (Western Digital Corporation)
• Inventors: Hong, Liubo, Pentek, Aron, Zheng, Yi, Zhu, Honglin
• Primary Examiner(s): Kim, Paul D
• Application Number:
  US12/874,116
• Publication Number:
  US 20120050915A1
• Time in Patent Office: 860 Days
• Field of Search: 2960312-60316, 296/031.8, 216/22, 216/39, 216/41, 216/48, 216/65, 360/121, 360/122, 360/317, 451/5, 451/41
• US Class Current: 29/603.16
• CPC Class Codes: G11B 5/1278 specially adapted for magnetisations perpendicular to the surface of the record carrier
• CPC Class Codes: G11B 5/23 Gap features G11B5/1871, G11B5/1875, G11B5/265, G11B5/29, G11B5/488 and subgroups, G11B5/4907 and subgroups, G11B5/4969 and subgroups take precedence
• CPC Class Codes: G11B 5/3116 Shaping of layers, poles or gaps for improving the form of the electrical signal transduced, e.g. for shielding, contour effect, equalizing, side flux fringing, cross talk reduction between heads or between heads and information tracks G11B5/3113, G11B5/245 take precedence
• CPC Class Codes: G11B 5/315 Shield layers on both sides of the main pole, e.g. in perpendicular magnetic heads
• CPC Class Codes: G11B 5/3163 Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
• CPC Class Codes: Y10T 29/49041 with significant slider/housing shaping or treating
• CPC Class Codes: Y10T 29/49043 Depositing magnetic layer or coating
• CPC Class Codes: Y10T 29/49044 Plural magnetic deposition layers
• CPC Class Codes: Y10T 29/49046 with etching or machining of magnetic material
• CPC Class Codes: Y10T 29/49048 Machining magnetic material [e.g., grinding, etching, polishing]
• CPC Class Codes: Y10T 29/49052 by etching

Abstract

A method for manufacturing a magnetic write head having a tapered write pole as well as a leading edge taper, and independent trailing and side magnetic shields. The method allows the write pole to be constructed by a dry process wherein the write pole material is either deposited by a process such as sputter deposition or electrically plated and the write pole shape is defined by masking and ion milling. The write pole has a stepped feature that can either be used to provide increased magnetic spacing between the trailing shield and the write pole at a location slightly recessed from the ABS or can be magnetic material that increases the effective thickness of the write pole at a location slightly recessed from the ABS. A bump structure can be further built over that stepped feature to enhance field gradient as well as reduce trailing shield saturation.

Claims

1. A method for manufacturing a magnetic write head, comprising:

depositing a magnetic write pole material;

forming a write pole defining mask structure over the magnetic write pole material;

performing an ion milling to remove a portion of the magnetic write pole material, thereby forming a magnetic write pole;

depositing a non-magnetic side gap material;

forming a side shield defining mask having an opening configured to define a side shield;

depositing a magnetic material into the opening in the side shield defining mask to form first and second magnetic side shields;

removing the side shield defining mask;

depositing a non-magnetic fill layer;

performing a chemical mechanical polishing;

performing an ion milling to remove a portion of the non-magnetic side gap layer that extends over the write pole;

forming a tapered trailing edge surface on the write pole;

depositing a non-magnetic trailing gap layer; and

forming a trailing shield over the non-magnetic trailing gap layer.

3. The method as in claim 1 wherein the forming a tapered trailing edge surface on the write pole further comprises, after performing the chemical mechanical polishing:

depositing a step layer;

forming a taper mask over the step layer;

performing an ion milling to remove a portion of the step layer and magnetic write pole material to form the tapered surface on the trailing edge of the magnetic write pole material.

8. The method as in claim 1 wherein the magnetic material deposited into the opening, in the side shield mask is a different material than the material used to form the trailing magnetic shield.

9. The method as in claim 1 wherein the magnetic material deposited into the opening in the side shield mask has a lower magnetic moment than the material used to form the trailing magnetic shield.

11. The method as in claim 1 wherein the chemical mechanical polishing is performed sufficiently to expose a portion of the non-magnetic side gap material.

12. The method as in claim 1 wherein the non-magnetic trailing gap layer separates the trailing magnetic shield from the magnetic side shield.

13. The method as in claim 1 wherein the non-magnetic trailing gap layer is formed so as to separate the magnetic write pole from the trailing magnetic shield, mid also to allow a portion of the trailing magnetic shield to contact a portion of each of the first and second magnetic side shields.

14. The method as in claim 1 further comprising, after depositing the non-magnetic trailing gap layer, forming a mask structure over the non-magnetic trailing gap layer, the mask structure leaving an area over the write pole covered, but leaving an area over the first and second side shields uncovered, and then performing an ion milling to remove the uncovered portions of the non-magnetic trailing gap material.

2. A method for manufacturing a magnetic write head, comprising:

depositing a non-magnetic layer, and forming a tapered surface on the non-magnetic material

after depositing the non-magnetic layer, and forming a tapered surface on the non-magnetic material, depositing a magnetic write pole material, at least a portion of the magnetic write pole material being deposited over the tapered surface of the non-magnetic material;

forming a write pole defining mask structure over the magnetic write pole material;

performing an ion milling to remove a portion of the magnetic write pole material, thereby forming a magnetic write pole;

depositing a non-magnetic side gap material;

forming a side shield defining mask having an opening configured to define a side shield;

depositing a magnetic material into the opening in the side shield defining mask to form first and second magnetic side shields;

removing the side shield defining mask;

depositing a non-magnetic fill layer;

performing a chemical mechanical polishing;

performing an ion milling to remove a portion of the non-magnetic side gap layer that extends over the write pole;

forming a tapered trailing edge surface on the write pole;

depositing a non-magnetic trailing gap layer; and

forming a trailing shield over the non-magnetic trailing gap layer.

4. A method for manufacturing a magnetic write head, comprising:

depositing a magnetic write pole material;

forming a write pole defining mask structure over the magnetic write pole material;

performing an ion milling to remove a portion of the magnetic write pole material, thereby forming a magnetic write pole;

depositing a non-magnetic side gap material;

forming a side shield defining mask having an opening configured to define a side shield;

depositing a magnetic material into the opening in the side shield defining mask to form first and second magnetic side shields;

removing the side shield defining mask;

depositing a non-magnetic fill layer;

performing a chemical mechanical polishing;

performing an ion milling to remove a portion of the non-magnetic side gap layer that extends over the write pole;

forming a tapered trailing edge surface on the write pole;

depositing a non-magnetic trailing gap layer; and

forming a trailing shield over the non-magnetic trailing gap layer;

wherein the forming a tapered trailing edge surface on the write pole further comprises, after performing the chemical mechanical polishing;

depositing a step layer;

forming a taper mask over the step layer;

performing an ion milling to remove a portion of the step layer and magnetic write pole material to form the tapered surface on the trailing edge of the magnetic write pole material; and

wherein the step layer comprises a magnetic material which serves as portion of the write pole.

20. The method as in claim 4 wherein the step layer forms a tapered trailing edge of the write pole, and wherein the step layer and the magnetic write pole material are formed by electroplating.

5. A method for manufacturing a magnetic write head, comprising:

depositing a magnetic write pole material;

forming a write pole defining mask structure over the magnetic write pole material;

performing an ion milling to remove a portion of the magnetic write pole material, thereby forming a magnetic write pole;

depositing a non-magnetic side gap material;

forming a side shield defining mask having an opening configured to define a side shield;

depositing a magnetic material into the opening in the side shield defining mask to form first and second magnetic side shields;

removing the side shield defining mask;

depositing a non-magnetic fill layer;

performing a chemical mechanical polishing;

performing an ion milling to remove a portion of the non-magnetic side gap layer that extends over the write pole;

forming a tapered trailing edge surface on the write pole;

depositing a non-magnetic trailing gap layer; and

forming a trailing shield over the non-magnetic trailing gap layer;

wherein the forming a tapered trailing edge surface on the mite pole further comprises, after performing the chemical mechanical polishing;

depositing a step layer;

forming a taper mask over the step layer;

performing an ion milling to remove a portion of the step layer and magnetic write pole material to form the tapered surface on the trailing edge of the magnetic write pole material; and

wherein the step layer comprises a non-magnetic material and serves to increase magnetic spacing between the trailing shield and the write pole in a region removed from an air bearing surface.

6. A method for manufacturing a magnetic write head, comprising:

depositing a magnetic write pole material;

forming a write pole defining mask structure over the magnetic write pole material;

performing an ion milling to remove a portion of the magnetic write pole material, thereby forming a magnetic write pole;

depositing a non-magnetic side gap material;

forming a side shield defining mask having an opening configured to define a side shield;

depositing a magnetic material into the opening in the side shield defining mask to form first and second magnetic side shields;

removing the side shield defining mask;

depositing a non-magnetic fill layer;

performing a chemical mechanical polishing;

performing an ion milling to remove a portion of the non-magnetic side gap layer that extends over the write pole;

forming a tapered trailing edge surface on the write pole;

depositing a non-magnetic trailing nap layer; and

forming a trailing shield over the non-magnetic trailing gap layer;

wherein the forming a tapered trailing edge surface on the write pole further comprises, after performing the chemical mechanical polishing;

depositing a step layer;

forming a taper mask over the step layer;

performing an ion milling to remove a portion of the step layer and magnetic write pole material to form the tapered surface on the trailing edge of the magnetic write pole material; and

further comprising, after performing an ion milling to remove a portion of the step layer and write pole material, depositing a non-magnetic bump material, and performing a second ion milling to remove a portion of the non-magnetic bump material, leaving a non-magnetic bump feature.

7. The method as in claim 6 further comprising after performing the second ion milling to remove a portion of the non-magnetic hump material to leave a non-magnetic bump feature, performing a further ion milling to remove a further portion of the magnetic write pole to further taper the trailing edge of the magnetic write pole.

10. A method for manufacturing a magnetic write head, comprising:

depositing a magnetic write pole material;

forming a write pole defining mask structure over the magnetic write pole material;

performing an ion milling to remove a portion of the magnetic write pole material, thereby forming a magnetic write pole;

depositing a non-magnetic side gap material;

forming a side shield defining mask having an opening configured to define a side shield;

depositing a magnetic material into the opening in the side shield defining mask to form first and second magnetic side shields;

removing the side shield defining mask;

depositing a non-magnetic fill layer;

performing a chemical mechanical polishing;

performing an ion milling to remove a portion of the non-magnetic side gap layer that extends over the write pole;

forming a tapered trailing edge surface on the write pole;

depositing a non-magnetic trailing gap layer; and

forming a trailing shield over the non-magnetic trailing gap layer; and

wherein the opening in the side shield defining mask has a depth measured from an air bearing surface plane that defines a throat height of a side shield; and

wherein the trailing magnetic shield has a throat height that is different from the throat height of the side shield.

15. A method for manufacturing a magnetic write head, comprising:

depositing a magnetic write pole material;

forming a write pole defining mask structure over the magnetic write pole material;

performing an ion milling to remove a portion of the magnetic write pole material, thereby forming a magnetic write pole;

depositing a non-magnetic side gap material;

forming a side shield defining mask having an opening configured to define a side shield;

depositing a magnetic material into the opening in the side shield defining mask to form first and second magnetic side shields;

removing the side shield defining mask;

depositing a non-magnetic fill layer;

performing a chemical mechanical polishing;

performing an ion milling to remove a portion of the non-magnetic side gap layer that extends over the write pole;

forming a tapered trailing edge surface on the write pole;

depositing a non-magnetic trailing gap layer; and

forming a trailing shield over the non-magnetic trailing gap layer; and

further comprising, after depositing the non-magnetic side gap material, and before forming the side shield defining mask;

depositing Al₂O₃;

performing a chemical mechanical polishing; and

performing a reactive ion etching to remove most of the Al₂O₃, leaving an Al₂O₃ side wall formed on first and second side portions of the non-magnetic side gap layer, the Al₂O₃ side wall having a vertical outer side.

16. The method as in claim 15, wherein the Al₂O₃ is deposited by atomic layer deposition.

17. The method as in claim 15, wherein the reactive ion etching is performed in an BCL₃/Cl₂ chemistry.

18. A method for manufacturing a magnetic write head, comprising:

depositing a non-magnetic layer comprising Cr, NiCr, Ru or Al₂O₃, and forming a tapered surface on the non-magnetic material

after depositing the non-magnetic layer, and forming a tapered surface on the non-magnetic material, depositing a magnetic write pole material, at least a portion of the magnetic write pole material being deposited over the tapered surface of the non-magnetic material;

forming a write pole defining mask structure over the magnetic write pole material;

performing an ion milling to remove a portion of the magnetic write pole material, thereby forming a magnetic write pole;

depositing a non-magnetic side gap material;

forming a side shield defining mask having an opening configured to define a side shield;

depositing a magnetic material into the opening in the side shield defining mask to form first and second magnetic side shields;

removing the side shield defining mask;

depositing a non-magnetic fill layer;

performing a chemical mechanical polishing;

performing an ion milling to remove a portion of the non-magnetic side gap layer that extends over the write pole;

forming a tapered trailing edge surface on the write pole;

depositing a non-magnetic trailing gap layer; and

forming a trailing shield over the non-magnetic trailing gap layer.

19. A method for manufacturing a magnetic write head, comprising:

depositing a non-magnetic layer, and forming a tapered surface on the non-magnetic material

after depositing the non-magnetic layer, and forming a tapered surface on the non-magnetic material, depositing a magnetic write pole material, at least a portion of the magnetic write pole material being deposited over the tapered surface of the non-magnetic material;

forming a write pole defining mask structure over the magnetic write pole material;

performing an ion milling to remove a portion of the magnetic write pole material, thereby forming a magnetic write pole;

depositing a non-magnetic side gap material;

forming a side shield defining mask having an opening configured to define a side shield;

depositing a magnetic material into the opening in the side shield defining mask to form first and second magnetic side shields;

removing the side shield defining mask;

depositing a non-magnetic fill layer;

performing a chemical mechanical polishing;

performing an ion milling to remove a portion of the non-magnetic side gap layer that extends over the write pole;

forming a tapered trailing edge surface on the write pole;

depositing a non-magnetic trailing gap layer; and

forming a trailing shield over the non-magnetic trailing gap layer;

wherein the tapered surface of the non-magnetic material has an angle of 20 to 40 degrees with respect to a plane of the as deposited magnetic material layer.

21. A method for manufacturing a magnetic write head, comprising:

depositing a magnetic write pole material;

forming a write pole defining mask structure over the magnetic write pole material;

performing an ion milling to remove a portion of the magnetic write pole material, thereby forming a magnetic write pole;

depositing a non-magnetic side gap material;

forming a side shield defining mask having an opening configured to define side shield;

depositing a magnetic material into the opening in the side shield defining mask to form first and second magnetic side shields;

removing the side shield defining mask;

depositing a non-magnetic fill layer;

performing a chemical mechanical polishing;

performing an ion milling to remove a portion of the non-magnetic side gap layer that extends over the write pole;

forming a tapered trailing edge surface on the write pole;

depositing a non-magnetic trailing gap layer; and

forming a trailing shield over the non-magnetic trailing gap layer;

wherein the forming a tapered trailing edge surface on the write pole further comprises, after performing the chemical mechanical polishing;

depositing a step layer;

forming a taper mask over the step layer;

performing an ion milling to remove a portion of the step layer and magnetic write pole material to form the tapered surface on the trailing edge of the magnetic write pole material; and

wherein the step layer comprises a magnetic material which serves as portion of the write pole;

wherein the step layer forms a tapered trailing edge of the write pole, and wherein the step layer and the magnetic write pole material are deposited by sputter deposition or ion beam deposition.

22. A method for manufacturing a magnetic write head, comprising:

depositing a magnetic write pole material;

forming a write pole defining mask structure over the magnetic write pole material;

performing an ion milling to remove a portion of the magnetic write pole material, thereby forming a magnetic write pole;

depositing a non-magnetic side gap material;

forming a side shield defining mask having an opening configured to define a side shield;

depositing a magnetic material into the opening in the side shield defining mask to form first and second magnetic side shields;

removing the side shield defining mask;

depositing a non-magnetic fill layer;

performing a chemical mechanical polishing;

performing an ion milling to remove a portion of the non-magnetic side gap layer that extends over the write pole;

forming a tapered trailing edge surface on the write pole;

depositing a non-magnetic trailing gap layer; and

forming a trailing shield over the non-magnetic trailing gap layer;

wherein the forming a tapered trailing edge surface on the write pole further comprises, after performing the chemical mechanical polishing;

depositing a step layer;

forming a taper mask over the step layer;

performing an ion milling to remove a portion of the step layer and magnetic write pole material to form the tapered surface on the trailing edge of the magnetic write pole material; and

wherein the step layer comprises a magnetic material which serves as portion of the write pole; and

wherein the step layer forms a tapered trailing edge of the write pole, and wherein the step layer and the magnetic write pole material are high magnetic moment magnetic materials.