Ultra-flat, high throughput wafer lapping process

• US 8,348,720 B1
• Filed: 06/27/2007
• Issued: 01/08/2013
• Est. Priority Date: 06/19/2007
• Status: Expired due to Fees

• Current Assignee: Rubicon Technology, Inc.
• Original Assignee: Rubicon Technology, Inc.
• Inventors: Ko, Donggeun
• Primary Examiner(s): RACHUBA, MAURINA T
• Application Number:
  US11/769,700
• Time in Patent Office: 2,022 Days
• Field of Search: 451/41, 451/56, 451/270, 451/271, 451285-290
• US Class Current: 451/41
• CPC Class Codes: B24B 37/042 operating processes therefor
• CPC Class Codes: B24B 37/107 in a rotary movement only, about an axis being stationary during lapping
• CPC Class Codes: B24B 37/30 for single side lapping of plane surfaces

Abstract

The present invention comprises of a process for lapping a high-throughput of ultra-flat wafers by utilizing a lapping apparatus containing a rotary flat, grooved polishing platen, at least two rotating pressurized heads each having a polishing wafer carrier that is adapted to receive a plurality of mounted wafers, and a plurality of concentric conditioning rings surrounding each pressurized head. The rotating pressurized heads are counterbalanced throughout the inventive process, and the lapping platen is continuously conditioned by simultaneously rotating the concentric conditioning rings over the lapping platen. This process allows continuous and controllable planarization thus allowing for a high throughput of wafers, while at the same time it prevents distortions in the lapping platen which reduces maintenance by providing continuous conditioning of the lapping platen. Further this inventive process allows substantially the entire surface of each wafer carrier to be utilized while maintaining a high quality planarized wafer product, highly desired in the semiconductor industry.

Claims

1. A method for polishing wafers and other substantially thin, rigid materials, comprising the steps of:

i. utilizing a lapping apparatus having a rotating flat, lapping platen;

at least one pair of rotating pressurized heads;

a plurality of wafer carriers, each adapted to receive at least one mounted wafer;

a plurality of concentric conditioning rings;

at least one wafer to be processed being made from a desired wafer material; and

a slurry dispenser containing slurry to be dispensed;

ii. removably affixing at least one wafer to the polishing wafer carrier;

iii. providing an slurry at a desired flow rate;

iv. selecting and setting a polishing downward force;

v. selecting and setting a polishing time;

vi. selecting and setting a rotational speed for the rotating lapping platen and each rotating pressurized head;

vii. continuously conditioning the lapping platen by rotating the plurality of concentric conditioning rings upon the lapping platen with a desired downward force and overhang; and

viii. operating the lapping apparatus with the plurality of rotating pressurized heads in counterbalanced pairs rotating in both clockwise and counterclockwise directions.

2. The method for polishing wafers in claim 1 wherein a majority of the entire surface of at least one wafer carrier has been covered with wafer material to be processed.

3. The method for polishing wafers in claim 1 wherein at least one wafer carrier is further provided with both an inner and outer marginal portions and both inner and outer marginal portions are provided with wafer material to be processed.

4. The method for polishing wafers in claim 1 wherein said step of providing an abrasive slurry at a desired flow rate further comprises the step of selecting and setting a flow rate of substantially between 1 ml/min to 200 ml/min.

5. The method for polishing wafers in claim 1 wherein the slurry provided is made from one or more materials selected from the following group:

diamond, silicon carbide, ceria, alumina, and any other abrasive material.

6. The method for polishing wafers in claim 1 wherein said step of selecting and setting a polishing down force pressure further comprises the step of utilizing a downward force substantially between 50 g/cm2 to 650 g/cm2.

7. The method for polishing wafers in claim 1 wherein said step of selecting and setting a polishing time further comprises the step of utilizing a polishing time substantially between 5 minutes to 3 hours.

8. The wafer polishing method of claim 1 wherein said step of operating the lapping apparatus with the plurality of rotating pressurized heads in counterbalanced pairs rotating in both clockwise and counterclockwise directions further comprises the step of operating the pressurized heads substantially between 20 to 60 revolutions per minute.

9. The wafer polishing method of claim 1 wherein said step of selecting and setting a revolution per minute for the lapping platen further comprises the step of operating the lapping platen substantially between 20 to 60 revolutions per minute.

10. The wafer polishing method of claim 1 wherein said step of utilizing a lapping apparatus having a lapping platen further comprises the step of utilizing a lapping apparatus having a lapping platen that is grooved in a geometric pattern.

11. The wafer polishing method of claim 10 wherein the geometric pattern provided is spiral.

12. The method of claim 1 wherein each of the plurality of concentric conditioning rings surrounds a respective one of the at least one pair of rotating pressurized heads.

13. The method of claim 1 wherein the plurality of wafer carriers are each adapted to receive a plurality of mounted wafers.

14. The method of claim 1 wherein the step of selecting and setting a polishing downward force sets an independent pressure control for each of the at least one pair of rotating pressurized heads.

15. The method of claim 1 wherein the step of selecting and setting a rotational speed for the rotating lapping platen and each rotating pressurized head sets an independent rotational speed for each rotating pressurized head.