Device patterning using irradiation
First Claim
Patent Images
1. A method for creating a pattern in a buffer layer of an organic electronic device, comprising selectively irradiating a portion of the layer to produce a layer wherein said portion of the layer that was irradiated is not light emitting while the portion of the layer that was not irradiated is light emitting and wherein said layer comprises poly(3,4-ethylenedioxythiophene)-poly(styrenesulfonate).
2 Assignments
0 Petitions
Accused Products
Abstract
In one embodiment, a method for creating a pattern in a layer of an organic electronic device that includes selectively irradiating a portion of the layer is provided, and devices and sub-assemblies made by the same.
-
Citations
16 Claims
- 1. A method for creating a pattern in a buffer layer of an organic electronic device, comprising selectively irradiating a portion of the layer to produce a layer wherein said portion of the layer that was irradiated is not light emitting while the portion of the layer that was not irradiated is light emitting and wherein said layer comprises poly(3,4-ethylenedioxythiophene)-poly(styrenesulfonate).
-
8. A system for creating a pattern in a buffer layer of an organic electronic device, comprising:
a layer of the organic electronic device;
said layer comprises poly(3,4-ethylenedioxythiophene)-poly(styrenesulfonate); anda light source for selectively irradiating a portion of the layer, wherein the selectively irradiated portion becomes non-conducting and non-light emitting upon irradiation. - View Dependent Claims (9, 10, 11, 12, 13)
-
14. An organic electronic device, comprising:
a buffer layer, wherein the buffer layer has a conducting portion and a non- conducting portion, and wherein the non-conducting portion of the buffer layer has been irradiated with ultraviolet light, said non-conducting portions being non-light emitting;
said buffer layer comprises poly(3,4-ethylenedioxythiophene)-poly(styrenesulfonate).- View Dependent Claims (15, 16)
Specification