×

Device patterning using irradiation

  • US 8,350,238 B2
  • Filed: 12/29/2005
  • Issued: 01/08/2013
  • Est. Priority Date: 12/30/2004
  • Status: Expired due to Fees
First Claim
Patent Images

1. A method for creating a pattern in a buffer layer of an organic electronic device, comprising selectively irradiating a portion of the layer to produce a layer wherein said portion of the layer that was irradiated is not light emitting while the portion of the layer that was not irradiated is light emitting and wherein said layer comprises poly(3,4-ethylenedioxythiophene)-poly(styrenesulfonate).

View all claims
  • 2 Assignments
Timeline View
Assignment View
    ×
    ×