Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

• US 8,351,019 B2
• Filed: 04/19/2010
• Issued: 01/08/2013
• Est. Priority Date: 04/11/2003
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Binnard, Michael
• Primary Examiner(s): Ton, Toan
• Assistant Examiner(s): KREUTZER, COLIN WRIGHT
• Application Number:
  US12/662,471
• Publication Number:
  US 20100203455A1
• Time in Patent Office: 995 Days
• Field of Search: 310 1205- 1206, 318/649, 355/30, 355/53, 355/72, 355/75, 355/77, 430/311
• US Class Current: 355/30
• CPC Class Codes: G03B 27/52 Details
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/70725 control
• CPC Class Codes: G03F 7/70733 Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask

Abstract

An apparatus and method maintain immersion fluid in the gap adjacent to the projection lens during the exchange of a work piece in a lithography machine. The apparatus and method include an optical assembly that projects an image onto a work piece and a stage assembly including a work piece table that supports the work piece adjacent to the optical assembly. An environmental system is provided to supply and remove an immersion fluid from the gap between the optical assembly and the work piece on the stage assembly. After exposure of the work piece is complete, an exchange system removes the work piece and replaces it with a second work piece. An immersion fluid containment system maintains the immersion liquid in the gap during removal of the first work piece and replacement with the second work piece.

Claims

1. A liquid immersion exposure apparatus in which a substrate is exposed to an exposure beam, the apparatus comprising:

an optical member through which the substrate is exposed to the exposure beam;

a cover member having a surface;

a first holding system that detachably holds the cover member; and

a second holding system that holds the cover member which is released from the first holding system, wherein the surface of the cover member held by the second holding system is opposite to the optical member in place of the substrate.

2. The apparatus according to claim 1, wherein the first holding system includes a vacuum holding system.

3. The apparatus according to claim 1, wherein the second holding system includes a vacuum holding system.

4. The apparatus according to claim 1, wherein the surface of the cover member is attracted to the second holding system.

5. The apparatus according to claim 1, further comprising a stage assembly including a substrate table which is movable relative to the optical member and which retains the substrate, wherein the first holding system holds the cover member on the stage assembly.

6. The apparatus according to claim 5, wherein the first holding system holds the cover member on the substrate table.

7. The apparatus according to claim 5, wherein the first holding system holds the cover member when the substrate table is under the optical member.

8. The apparatus according to claim 5, wherein the first holding system holds the cover member when exposing the substrate.

9. The apparatus according to claim 5, wherein the substrate table is movable relative to the second holding system, and wherein the substrate table is movable away from under the optical member when the cover member is held by the second holding system.

10. The apparatus according to claim 5, wherein an immersion liquid is filled in a gap between the optical member and the surface of the cover member, while the second holding system holds the cover member.

11. The apparatus according to claim 10, wherein during a transition from a first state in which the cover member is held by the first holding system to a second state in which the cover member is held by the second holding system, the optical member is kept in contact with the immersion liquid.

12. The apparatus according to claim 1, wherein an immersion liquid is filled in a gap between the optical member and the surface of the cover member, while the second holding system holds the cover member.

13. The apparatus according to claim 12, wherein during a transition from a first state in which the cover member is held by the first holding system to a second state in which the cover member is held by the second holding system, the optical member is kept in contact with the immersion liquid.

14. A liquid immersion exposure method in which a substrate is exposed to an exposure beam, the method comprising:

providing the substrate opposite to an optical member;

releasing a cover member from a first holding system; and

holding the cover member released from the first holding system by a second holding system so that the cover member is opposite to the optical member in place of the substrate.

15. The method according to claim 14, wherein the first holding system holds the cover member on a stage assembly which includes a substrate table, the substrate table being movable relative to the optical member.

16. The method according to claim 15, wherein the first holding system holds the cover member on the substrate table.

17. The method according to claim 15, wherein the first holding system holds the cover member when the substrate table is under the optical member.

18. The method according to claim 15, wherein the first holding system holds the cover member when exposing the substrate.

19. The method according to claim 14, wherein an immersion liquid is filled in a gap between the optical member and the surface of the cover member, while the second holding system holds the cover member.

20. The method according to claim 19, wherein during a transition from a first state in which the cover member is held by the first holding system to a second state in which the cover member is held by the second holding system opposite to the optical member, the optical member is kept in contact with the immersion liquid.

21. A device manufacturing method comprising:

providing a substrate opposite to an optical member through which the substrate is exposed to an exposure beam;

releasing a cover member from a first holding system; and

holding the cover member released from the first holding system by a second holding system so that a surface of the cover member is opposite to the optical member in place of the substrate.

22. The method according to claim 21, wherein the substrate is retained on a substrate table, and wherein the first holding system holds the cover member when exposing the substrate.

23. The method according to claim 21, wherein an immersion liquid is filled in a gap between the optical member and the surface of the cover member, while the second holding system holds the cover member.

24. The method according to claim 23, wherein during a transition from a first state in which the cover member is held by the first holding system to a second state in which the cover member is held by the second holding system opposite to the optical member, the optical member is kept in contact with the immersion liquid.

25. The method according to claim 21, wherein the substrate includes a semiconductor wafer.

26. A liquid immersion exposure apparatus comprising:

an optical member through which a substrate is exposed;

a stage assembly including a substrate table that retains the substrate; and

a cover member having a surface,

wherein the cover member and the substrate table are relatively movable, and

wherein the cover member is positioned under the optical member by using the stage assembly in place of the substrate table to substantially maintain an immersion liquid in a space under the optical member when the substrate table is moved away from under the optical member.

27. The apparatus according to claim 26, wherein during a transition from a first state in which one of the substrate table and the cover member is under the optical member to a second state in which the other of the substrate table and the cover member is under the optical member in place of the one of the substrate table and the cover member, the immersion liquid is maintained in the space under the optical member.

28. The apparatus according to claim 27, wherein in the transition, the cover member and the substrate table are moved together in a state in which the cover member and the substrate table are adjacent to each other.

29. The apparatus according to claim 28, wherein in the transition, the cover member and the substrate table form a substantially continuous surface.

30. The apparatus according to claim 28, wherein positional relation between the surface of the cover member and a surface of the substrate table is adjusted for the transition.

31. The apparatus according to claim 26, wherein the cover member is provided on the stage assembly.

32. The apparatus according to claim 31, wherein the cover member is provided adjacent to the substrate table.

33. The apparatus according to claim 32, wherein the cover member and the substrate table form a substantially continuous surface.

34. The apparatus according to claim 32, wherein positional relation between the surface of the cover member and a surface of the substrate table is adjustable.

35. The apparatus according to claim 26, wherein positional relation between the surface of the cover member and a surface of the substrate table is adjustable.

36. The apparatus according to claim 35, wherein adjusting the positional relation includes adjusting the tilt of the substrate table.

37. A liquid immersion exposure method in which a substrate is exposed to an exposure beam, the method comprising:

providing the substrate, retained on a substrate table of a stage assembly, opposite to an optical member;

moving the substrate table away from under the optical member by using the stage assembly; and

positioning a cover member, by using the stage assembly, opposite to the optical member in place of the substrate table when the substrate table is moved away from under the optical member to substantially maintain an immersion liquid in a space under the optical member, the cover member being different from the substrate table, and the cover member and the substrate table being relatively movable.

38. The method according to claim 37, wherein during a transition from a first state in which the substrate table is under the optical member to a second state in which the cover member is under the optical member in place of the substrate table, the immersion liquid is maintained in the space under the optical member.

39. The method according to claim 38, further comprising moving the cover member and the substrate table together in a state in which the cover member and the substrate table are adjacent to each other in the transition.

40. The method according to claim 39, wherein in the transition, the cover member and the substrate table form a substantially continuous surface.

41. The method according to claim 39, further comprising adjusting positional relation between a surface of the cover member and a surface of the substrate table for the transition.

42. The method according to claim 37, wherein the cover member is provided on the stage assembly.

43. The method according to claim 42, wherein the cover member is provided adjacent to the substrate table.

44. The method according to claim 43, further comprising adjusting positional relation between a surface of the cover member and a surface of the substrate table.

45. The method according to claim 37, further comprising adjusting positional relation between a surface of the cover member and a surface of the substrate table.

46. The method according to claim 45, wherein adjusting the positional relation includes adjusting the tilt of the substrate table.

47. A device manufacturing method in which a substrate is exposed to an exposure beam, the method comprising:

providing the substrate, retained on a substrate table of a stage assembly, opposite to an optical member;

moving the substrate table away from under the optical member by using the stage assembly; and

positioning a cover member, by using the stage assembly, opposite to the optical member in place of the substrate table when the substrate table is moved away from under the optical member to substantially maintain an immersion liquid in a space under the optical member, the cover member being different from the substrate table, and the cover member and the substrate table being relatively movable.

48. The method according to claim 47, wherein during a transition from a first state in which the substrate table is under the optical member to a second state in which the cover member is under the optical member in place of the substrate table, the immersion liquid is maintained in the space under the optical member.

49. The method according to claim 48, further comprising moving the cover member and the substrate table together in a state in which the cover member and the substrate table are adjacent to each other in the transition.

50. The method according to claim 48, wherein the substrate includes a semiconductor wafer.