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Optical system, exposure system, and exposure method

  • US 8,351,021 B2
  • Filed: 02/05/2010
  • Issued: 01/08/2013
  • Est. Priority Date: 01/27/2004
  • Status: Expired due to Fees
First Claim
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1. An optical systemcomprisinga birefringent optical rotator which is made of an optical material with linear birefringence and optical rotatory power, an optic axis of the birefringent optical rotator is arranged substantially in parallel with an optical axis of the optical system, whereina beam bundle in a substantially circular polarization state is incident to the birefringent optical rotator,the birefringent optical rotator is located at a position where a beam bundle of substantially spherical waves is incident thereto, andthe birefringent optical rotator includesa required thickness for converting a beam bundle in a peripheral region of the incident beam bundle into a beam bundle in a substantially linear polarization state of substantially circumferential vibration in a lens aperture,a first optically transparent member made of an optical material with clockwise optical rotatory power, anda second optically transparent member made of an optical material with counterclockwise optical rotatory power.

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