Power semiconductor structure with field effect rectifier and fabrication method thereof
First Claim
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1. A power semiconductor structure with a field effect rectifier, comprising:
- a drain region;
a body region, located above the drain region;
a source region, located in the body region;
a gate channel, located in the body region and adjacent to a gate structure; and
a current channel, located in the body region and adjacent to a conductive structure located in a trench and coupled to the source region, the current channel being extended from the source region downward to the drain region, and the current channel is much shorter than the gate channel, wherein the trench extended downward from the source region.
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Abstract
A power semiconductor structure with a field effect rectifier having a drain region, a body region, a source region, a gate channel, and a current channel is provided. The body region is substantially located above the drain region. The source region is located in the body region. The gate channel is located in the body region and adjacent to a gate structure. The current channel is located in the body region and is extended from the source region downward to the drain region. The current channel is adjacent to a conductive structure coupled to the source region.
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Citations
14 Claims
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1. A power semiconductor structure with a field effect rectifier, comprising:
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a drain region; a body region, located above the drain region; a source region, located in the body region; a gate channel, located in the body region and adjacent to a gate structure; and a current channel, located in the body region and adjacent to a conductive structure located in a trench and coupled to the source region, the current channel being extended from the source region downward to the drain region, and the current channel is much shorter than the gate channel, wherein the trench extended downward from the source region. - View Dependent Claims (2, 3, 4, 5)
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6. A fabrication method of a power semiconductor structure with a field effect rectifier comprising the steps of:
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(a) providing a base with a drain region therein; (b) forming a conductive structure above the drain region, wherein the conductive structure is located in a trench, and at least a gate structure is formed in the base; (c) forming a body region surrounding the conductive structure; and (d) forming a source region in the body region to form a current channel in the body region adjacent to the conductive structure extended downward from the source region to the drain region, and to form a gate channel located in the body region adjacent to the gate structure, wherein the trench extended downward from the source region, and the current channel is much shorter than the gate channel. - View Dependent Claims (7, 8, 9, 10, 11, 12, 13, 14)
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Specification