×

Power semiconductor structure with field effect rectifier and fabrication method thereof

  • US 8,357,952 B2
  • Filed: 04/07/2011
  • Issued: 01/22/2013
  • Est. Priority Date: 05/13/2010
  • Status: Active Grant
First Claim
Patent Images

1. A power semiconductor structure with a field effect rectifier, comprising:

  • a drain region;

    a body region, located above the drain region;

    a source region, located in the body region;

    a gate channel, located in the body region and adjacent to a gate structure; and

    a current channel, located in the body region and adjacent to a conductive structure located in a trench and coupled to the source region, the current channel being extended from the source region downward to the drain region, and the current channel is much shorter than the gate channel, wherein the trench extended downward from the source region.

View all claims
  • 2 Assignments
Timeline View
Assignment View
    ×
    ×