Method of forming optical sensor
First Claim
Patent Images
1. A method of forming an optical sensor, comprising:
- providing a substrate, and forming a read-out device on the substrate;
forming a first electrode electrically connected to the read-out device on the substrate;
forming a photosensitive silicon-rich dielectric layer on the first electrode, wherein the photosensitive silicon-rich dielectric layer comprises a plurality of nanocrystalline silicon crystals; and
forming a second electrode on the photosensitive silicon-rich dielectric layer.
1 Assignment
0 Petitions
Accused Products
Abstract
A method of forming an optical sensor includes the following steps. A substrate is provided, and a read-out device is formed on the substrate. a first electrode electrically connected to the read-out device is formed on the substrate. a photosensitive silicon-rich dielectric layer is formed on the first electrode, wherein the photosensitive silicon-rich dielectric layer comprises a plurality of nanocrystalline silicon crystals. A second electrode is formed on the photosensitive silicon-rich dielectric layer.
20 Citations
17 Claims
-
1. A method of forming an optical sensor, comprising:
-
providing a substrate, and forming a read-out device on the substrate; forming a first electrode electrically connected to the read-out device on the substrate; forming a photosensitive silicon-rich dielectric layer on the first electrode, wherein the photosensitive silicon-rich dielectric layer comprises a plurality of nanocrystalline silicon crystals; and forming a second electrode on the photosensitive silicon-rich dielectric layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
-
Specification