Contact structure for semiconductor device having trench shield electrode and method
First Claim
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1. A semiconductor device structure comprising:
- a region of semiconductor material having a major surface;
a first trench structure formed in the region of semiconductor material, wherein the first trench structure includes a control electrode layer and a shield electrode layer;
a contact structure formed in the region of semiconductor material, wherein the first trench structure terminates in the contact structure, and wherein upper surfaces of both the control electrode layer and the shield electrode layer in the contact structure are recessed within the first trench without overlapping the major surface of the region of semiconductor material in the contact structure;
a first conductive layer coupled to the control electrode layer within the first trench structure; and
a second conductive layer coupled to the shield electrode layer within the first trench structure.
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Abstract
In one embodiment, a contact structure for a semiconductor device having a trench shield electrode includes a gate electrode contact portion and a shield electrode contact portion within a trench structure. Contact is made to the gate electrode and the shield electrode within or inside of the trench structure. A thick passivating layer surrounds the shield electrode in the contact portion.
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Citations
22 Claims
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1. A semiconductor device structure comprising:
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a region of semiconductor material having a major surface; a first trench structure formed in the region of semiconductor material, wherein the first trench structure includes a control electrode layer and a shield electrode layer; a contact structure formed in the region of semiconductor material, wherein the first trench structure terminates in the contact structure, and wherein upper surfaces of both the control electrode layer and the shield electrode layer in the contact structure are recessed within the first trench without overlapping the major surface of the region of semiconductor material in the contact structure; a first conductive layer coupled to the control electrode layer within the first trench structure; and a second conductive layer coupled to the shield electrode layer within the first trench structure. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A semiconductor device structure comprising:
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a region of semiconductor material having a major surface, an active area, and a contact area; a trench having a striped shape formed in the region of semiconductor material and extending from the active area to the contact area; a shield electrode formed in the trench and separated from the region of semiconductor material by a first insulator layer; a control electrode formed in the trench and separated from the region of semiconductor material by a second insulator layer and separated from the shield electrode by a third insulator layer, wherein shield electrode and the control electrode terminate in the contact area without overlapping the major surface of the region of semiconductor material in the contact area, and wherein the shield electrode and the control electrode are recessed below the major surface of the region of semiconductor material in the contact area; a first conductive structure contacting the control electrode inside the trench within the contact area; and a second conductive structure contacting the shield electrode inside the trench within the contact area. - View Dependent Claims (14, 15, 16, 17)
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18. A semiconductor device structure comprising:
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a region of semiconductor material having a major surface, an active area, and a contact area; a trench having a striped shape formed in the region of semiconductor material and extending from the active area to the contact area; a shield electrode formed in the trench and separated from the region of semiconductor material by a first insulator layer; a control electrode formed in the trench and separated from the region of semiconductor material by a second insulator layer and separated from the shield electrode by a third insulator layer, wherein the shield electrode and the control electrode terminate in the contact area without overlapping the major surface of the region of semiconductor material in the contact area, and wherein the control electrode is recessed below the major surface of the region of semiconductor material in the contact area, and wherein the first and third insulator layers are thicker than the second insulator layer, and wherein the first and third insulator layers isolate the shield electrode from the control electrode adjacent the major surface of the region of semiconductor material in the contact area; a first conductive structure contacting the control electrode inside the trench within the contact area; and a second conductive structure contacting the shield electrode within the contact area. - View Dependent Claims (19, 20, 21)
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22. A method for forming a semiconductor device comprising the steps of:
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providing a region of semiconductor material having a major surface, an active area, and a contact area; forming a trench having a striped shape in the region of semiconductor material and extending from the active area to the contact area; forming a shield electrode in the trench and separated from the region of semiconductor material by a first insulator layer; forming a control electrode in the trench and separated from the region of semiconductor material by a second insulator layer and separated from the shield electrode by a third insulator layer, wherein the shield electrode and the control electrode terminate in the contact area without overlapping the major surface of the region of semiconductor material in the contact area, and wherein the shield electrode and the control electrode are recessed below the major surface of the region of semiconductor material in the contact area; forming a first conductive structure contacting the control electrode inside the trench within the contact area; and forming a second conductive structure contacting the shield electrode inside the trench within the contact area.
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Specification