Optical imaging device with thermal attenuation
First Claim
1. An optical imaging device, comprising:
- a mask device for receiving a mask comprising a pattern;
a substrate device for receiving a substrate;
an immersion liquid; and
a projection device comprising a plurality of optical elements and a thermal attenuation device, the optical imaging device being configured so that during operation the plurality of optical elements projects the pattern onto the substrate and the thermal attenuation device reduces fluctuations in a temperature distribution of an immersion element of the plurality of optical elements induced by the immersion liquid,wherein the immersion element is the optical element closest to the substrate and adjacent to the immersion liquid so that the immersion liquid is located between the immersion element and the substrate, the immersion element comprising a first area and a second area where the first area is optically used during operation of the optical imaging device and the second area is optically unused during operation of the optical imaging device, the second area comprising a first section adjacent the immersion liquid during operation of the optical imaging device and a second section non-adjacent to the immersion liquid during operation of the optical imaging device, andthe thermal attenuation device comprises a first shielding which is a thermal decoupling device that thermally shields at least a part of the first section of the second area of the immersion element, and the first shielding is between the immersion element and the immersion liquid.
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Accused Products
Abstract
An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. A thermal attenuation device is provided, the thermal attenuation device being adapted to reduce fluctuations within the temperature distribution of the immersion element induced by the immersion medium.
135 Citations
48 Claims
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1. An optical imaging device, comprising:
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a mask device for receiving a mask comprising a pattern; a substrate device for receiving a substrate; an immersion liquid; and a projection device comprising a plurality of optical elements and a thermal attenuation device, the optical imaging device being configured so that during operation the plurality of optical elements projects the pattern onto the substrate and the thermal attenuation device reduces fluctuations in a temperature distribution of an immersion element of the plurality of optical elements induced by the immersion liquid, wherein the immersion element is the optical element closest to the substrate and adjacent to the immersion liquid so that the immersion liquid is located between the immersion element and the substrate, the immersion element comprising a first area and a second area where the first area is optically used during operation of the optical imaging device and the second area is optically unused during operation of the optical imaging device, the second area comprising a first section adjacent the immersion liquid during operation of the optical imaging device and a second section non-adjacent to the immersion liquid during operation of the optical imaging device, and the thermal attenuation device comprises a first shielding which is a thermal decoupling device that thermally shields at least a part of the first section of the second area of the immersion element, and the first shielding is between the immersion element and the immersion liquid. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37)
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38. A method, comprising:
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using a projection device to project a pattern from a mask onto a substrate, wherein the projection device comprises; a plurality of optical elements comprising an immersion element, the immersion element being the optical element closest to the substrate and adjacent to an immersion liquid between the optical elements and the substrate, the immersion element comprising a first area and a second area where the first area is optically used and the second area is optically unused, the second area comprising a first section adjacent the immersion liquid and a second section non-adjacent to the immersion liquid, and a thermal attenuation device comprising a first shielding-which thermally shields at least a part of the first section of the second area of the immersion element, and the first shielding is between the immersion element and the immersion liquid, and using the thermal attenuation device to reduce fluctuations in a temperature distribution of the immersion element induced by the immersion liquid. - View Dependent Claims (39, 40, 41)
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42. An optical imaging device, comprising:
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a mask device for receiving a mask comprising a pattern; a substrate device for receiving a substrate; an immersion liquid; and a projection device comprising a holding device, a plurality of optical elements and a thermal attenuation device, the optical imaging device being configured so that during operation the plurality of optical elements projects the pattern onto the substrate and the thermal attenuation device reduces fluctuations in a temperature distribution of an immersion element of the plurality of optical elements induced by the immersion liquid, wherein the immersion element is held by the holding device, the immersion element being the optical element closest to the substrate, the immersion liquid being located between the immersion element and the substrate, the immersion element comprising a first area and a second area where the first area is optically used during operation of the optical imaging device and the second area is optically unused during operation of the optical imaging device, the second area comprising a first section adjacent the immersion liquid during operation of the optical imaging device and a second section non-adjacent to the immersion liquid during operation of the optical imaging device, and the thermal attenuation device comprises a shielding which is a thermal decoupling device that thermally shields the holding device and at least a part of the second section of the second area of the immersion element. - View Dependent Claims (43, 44, 45)
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46. An optical imaging device, comprising:
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a mask device for receiving a mask comprising a pattern; a substrate device for receiving a substrate; an immersion liquid; and a projection device comprising a plurality of optical elements and a thermal attenuation device, the optical imaging device being configured so that during operation the plurality of optical elements projects the pattern onto the substrate and the thermal attenuation device reduces fluctuations in a temperature distribution of an immersion element of the plurality of optical elements induced by the immersion liquid, wherein the immersion element is the optical element closest to the substrate and adjacent to the immersion liquid so that the immersion liquid is located between the immersion element and the substrate, the immersion element comprising a first area and a second area where the first area is optically used during operation of the optical imaging device and the second area is optically unused during operation of the optical imaging device, the second area comprising a first section adjacent the immersion liquid during operation of the optical imaging device and a second section non-adjacent to the immersion liquid during operation of the optical imaging device, and wherein the thermal attenuation device comprises a first shielding which is a thermal decoupling device that contacts a surface of the immersion element over at least a part of the first section of the second area of the immersion element and thermally shields this contacted part. - View Dependent Claims (47, 48)
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Specification