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Lithographic apparatus and device manufacturing method

  • US 8,363,208 B2
  • Filed: 02/04/2010
  • Issued: 01/29/2013
  • Est. Priority Date: 06/11/2003
  • Status: Active Grant
First Claim
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1. A lithographic projection apparatus comprising:

  • a support structure configured to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section;

    a substrate table configured to hold a substrate;

    a projection system arranged to project the patterned radiation beam onto a target portion of the substrate;

    a liquid supply system configured to at least partly fill a space between the projection system and the substrate table with a liquid; and

    a cleaning device configured to dislodge bubbles or contaminants from the substrate, the substrate table, or both the substrate and substrate table.

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