Scanner based optical proximity correction system and method of use
First Claim
1. A modeling method, comprising:
- inputting tool parameters into a model;
inputting basic model parameters into the model;
generating a simulated, corrected reticle design using the tool parameters and the basic model parameters;
comparing an image of test patterns for an integrated circuit against the simulated, corrected reticle design;
determining whether a difference between the simulated, corrected reticle design and exposure results of the image of the test patterns (δ
1) is less than a predetermined criteria (ε
1); and
completing the model when the difference between the simulated, corrected reticle design and the exposure results of the image of the test patterns is less than the predetermined criteria.
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Accused Products
Abstract
A modeling technique is provided. The modeling technique includes inputting tool parameters into a model and inputting basic model parameters into the model. The technique further includes generating a simulated, corrected reticle design using the tool parameters and the basic model parameters. An image of test patterns for an integrated circuit is compared against the simulated, corrected reticle design. A determination is made as to whether a difference between the simulated, corrected reticle design and exposure results of the image of the test patterns (δ1) is less than a predetermined criteria (ε1). The technique further includes completing the model the difference between the simulated, corrected reticle design and the exposure results of the image of the test patterns is less than the predetermined criteria.
26 Citations
28 Claims
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1. A modeling method, comprising:
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inputting tool parameters into a model; inputting basic model parameters into the model; generating a simulated, corrected reticle design using the tool parameters and the basic model parameters; comparing an image of test patterns for an integrated circuit against the simulated, corrected reticle design; determining whether a difference between the simulated, corrected reticle design and exposure results of the image of the test patterns (δ
1) is less than a predetermined criteria (ε
1); andcompleting the model when the difference between the simulated, corrected reticle design and the exposure results of the image of the test patterns is less than the predetermined criteria. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A system for deploying an application for modeling a design layout, comprising:
a computer infrastructure operable to; generate a simulated, corrected reticle design using tool parameters and basic model parameters; compare an image of test patterns for an integrated circuit against the simulated, corrected reticle design; compare a difference between the simulated, corrected reticle design and exposure results of the image of the test patterns with a predetermined criteria; and complete the model when the difference between the simulated, corrected reticle design and the exposure results of the image of the test patterns is less than the predetermined criteria. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19)
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20. An exposure apparatus, comprising at least one module configured to:
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generate a simulated, corrected reticle design using tool parameters and basic model parameters; compare an image of test patterns for an integrated circuit against the simulated, corrected reticle design; compare a difference between the simulated, corrected reticle design and exposure results of the image of the test patterns with a predetermined criteria; and complete the model when the difference between the simulated, corrected reticle design and the exposure results of the image of the test patterns is less than the predetermined criteria. - View Dependent Claims (21, 22, 23)
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24. A method of providing a model, comprising:
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generating a simulated, corrected reticle design using tool parameters and basic model parameters; comparing an image of test patterns for an integrated circuit against the simulated, corrected reticle design; iteratively comparing a difference between the simulated, corrected reticle design and exposure results of the image of the test patterns and a predetermined criteria; and changing at least one of tool parameters and basic model parameters until the difference between the simulated, corrected reticle design and the exposure results of the image of the test patterns is less than the predetermined criteria in the comparing.
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25. A computer program product comprising a computer-readable storage medium having readable program code embodied in the computer-readable storage medium, the computer program product includes at least one component to:
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generate a simulated, corrected reticle design using tool parameters and basic model parameters; and iteratively change at least one of the tool parameters and basic model parameters and compare a difference between the simulated, corrected reticle design and exposure results of an image of test patterns for an integrated circuit with a predetermined criteria until the difference between the simulated, corrected reticle design and the exposure results of the image of the test patterns is less than the predetermined criteria. - View Dependent Claims (26, 27, 28)
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Specification