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Generating cut mask for double-patterning process

  • US 8,365,108 B2
  • Filed: 01/06/2011
  • Issued: 01/29/2013
  • Est. Priority Date: 01/06/2011
  • Status: Expired due to Fees
First Claim
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1. A computer-implemented method of designing a photomask, performed using at least one computing device, the method comprising:

  • simulating a first photomask patterning process using a first photomask design to create simulated contours, using the at least one computing device;

    comparing the simulated contours to a desired design;

    identifying regions not common to the simulated contours and the desired design;

    creating desired target shapes for a second photomask patterning process subsequent to the first photomask patterning process based upon the identified regions, using the at least one computing device; and

    providing the desired target shapes for forming of a second photomask design based upon the desired target shapes.

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