Retaining ring and articles for carrier head
First Claim
Patent Images
1. A retaining ring for a chemical mechanical polishing head, comprising:
- an upper portion configured to be secured to a base; and
a lower portion having a bottom surface to contact a polishing pad during polishing, wherein the upper portion and the lower portion are the same material and include a blend of semi-crystalline thermoplastic polyester and polytetrafluoroethylene.
1 Assignment
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Accused Products
Abstract
A carrier head for chemical mechanical polishing that has a base, a mounting assembly connected to the base having a surface for contacting a substrate, and a retaining ring secured to the base. The retaining ring can include perfluoroalkoxy, polyetherketoneketone, polybenzimidazole, a semi-crystalline thermoplastic polyester, or a long molecular chain molecule produced from poly-paraphenylene terephthalamide.
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Citations
6 Claims
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1. A retaining ring for a chemical mechanical polishing head, comprising:
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an upper portion configured to be secured to a base; and a lower portion having a bottom surface to contact a polishing pad during polishing, wherein the upper portion and the lower portion are the same material and include a blend of semi-crystalline thermoplastic polyester and polytetrafluoroethylene. - View Dependent Claims (2, 3)
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4. A carrier head for chemical mechanical polishing, comprising:
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a base; a mounting assembly attached to the base having a surface for contacting a substrate; and a retainer having an upper portion configured to be secured to the base and a lower portion having a bottom surface to contact a polishing pad during polishing, wherein the upper portion and the lower portion are the same material and include a blend of semi-crystalline thermoplastic polyester and polytetrafluoroethylene. - View Dependent Claims (5, 6)
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Specification