Planar optical structure forming an evanescent field measuring platform that includes a layer molded by a master

• US 8,380,020 B2
• Filed: 06/21/2010
• Issued: 02/19/2013
• Est. Priority Date: 08/30/2001
• Status: Expired due to Fees

• Current Assignee: Bayer Intellectual Property GmbH (Bayer AG)
• Original Assignee: Bayer Intellectual Property GmbH (Bayer AG), Weidmann Plastics Technology AG (Techniplas LLC)
• Inventors: Callenbach, Tilo, Bopp, Martin Andreas, Ehrat, Markus, Gmr, Max, Lthi, Heinz, Pawlak, Michael
• Primary Examiner(s): LEPISTO, RYAN A
• Application Number:
  US12/819,598
• Publication Number:
  US 20100255461A1
• Time in Patent Office: 974 Days
• Field of Search: 385/12, 385/37, 385/130
• US Class Current: 385/12
• CPC Class Codes: B29C 2045/7356 the temperature of the mould being near or higher than the melting temperature or glass transition temperature of the moulding material
• CPC Class Codes: B29C 33/38 characterised by the material or the manufacturing process B29C33/44 takes precedence
• CPC Class Codes: B29C 33/424 Moulding surfaces provided with means for marking or patterning for injection moulding B29C45/372
• CPC Class Codes: B29C 45/0001 characterised by the choice of material
• CPC Class Codes: B29C 45/37 Mould cavity walls , i.e. the inner surface forming the mould cavity, e.g. linings
• CPC Class Codes: B29C 45/372 provided with means for marking or patterning, e.g. numbering articles
• CPC Class Codes: B29D 11/00009 Production of simple or compound lenses
• CPC Class Codes: B29K 2709/08 Glass
• CPC Class Codes: G02B 2006/12107 Grating
• CPC Class Codes: G02B 6/1221 made from organic materials
• CPC Class Codes: G02B 6/13 Integrated optical circuits characterised by the manufacturing method
• CPC Class Codes: G02B 6/34 utilising prism or grating G02B6/293 takes precedence
• CPC Class Codes: Y10T 428/12597 Noncrystalline silica or noncrystalline plural-oxide component [e.g., glass, etc.]
• CPC Class Codes: Y10T 428/315 Surface modified glass [e.g., tempered, strengthened, etc.]

Abstract

The planar optical structure forms an evanescent-field measuring platform. A body is made from the thermoplastic plastic with a three-dimensionally structured surface, wherein molding is performed directly from a master made of glass coated with metal oxide, without deposition of further coatings on a surface of the master. The planar optical structure forming an evanescent-field measuring platform has a first essentially optically transparent, waveguiding layer (a) with a refractive index n₁ and a second essentially optical transparent layer (b) with refractive index n₂, where n₁>n₂, in a case of an embodiment of a planar optical film waveguide, or a metal layer (a′) and a second layer (b), in a case of an embodiment for generating a surface plasmon resonance, wherein the second layer (b) includes a material from a group of cyclo-olefin polymers and cyclo-olefin copolymers.

Claims

1. A planar optical structure having an evanescent-field measuring platform, wherein said evanescent-field measuring platform comprises a multilayer system that has:

at least one of a metal layer and an essentially optically transparent wave guiding layer, said at least one of a metal layer and an essentially optically transparent wave guiding layer having a refractive index n₁,

at least an essentially optically transparent second layer with a refractive index n₂, where n₁>

n₂, and

at least one optical coupling grating for in-coupling of excitation light,

wherein said essentially optically transparent second layer comprises a thermoplastic plastic selected from the group consisting of cyclo-olefin polymers and cyclo-olefin copolymers,

wherein said optical coupling grating is formed by the process of molding said optical coupling grating into said essentially optically transparent second layer from a master.

2. A planar optical structure having an evanescent-field measuring platform according to claim 1, wherein said evanescent-field measuring platform is operable to generate a surface plasmon resonance.

3. A planar optical structure having an evanescent-field measuring platform according to claim 1, wherein said evanescent-field measuring platform is a planar optical film waveguide and said at least one of a metal layer and an essentially optically transparent wave guiding layer includes said essentially optically transparent wave guiding layer as a first optically transparent layer.

4. A planar optical structure having an evanescent-field measuring platform according to claim 3, wherein said refractive index n₁ is greater than 1.8.

5. A planar optical structure having an evanescent-field measuring platform according to claim 3, wherein said first optically transparent layer comprises TiO₂, ZnO, Nb₂O₅, Ta₂O₅, HfO₂, or ZrO₂.

6. A planar optical structure having an evanescent-field measuring platform according to claim 3, wherein said first optically transparent layer comprises TiO₂ or Ta₂O₅.

7. A planar optical structure having an evanescent-field measuring platform according to claim 3, wherein said first essentially optically transparent wave guiding layer is in optical contact with said at least one optical coupling grating for in-coupling of excitation light of one or more wavelengths, from one or more light sources, into said first essentially optically transparent wave guiding layer.

8. A planar optical structure having an evanescent-field measuring platform according to claim 3, wherein light guided in said first essentially optically transparent layer is out-coupled using grating structures which are features in said first essentially optically transparent layer.

9. A planar optical structure having an evanescent-field measuring platform according to claim 3, wherein a third optically transparent layer, having a lower refractive index than that of said first essentially optically transparent layer and a thickness of 5 nm-10000 nm, is provided between said at least one first essentially optically transparent layer and said second essentially optically transparent layer and in contact with said at least one first essentially optically transparent layer.

10. A planar optical structure for generating an evanescent-field measuring platform according to claim 3, wherein multiple grating structures are provided on a common, continuous substrate of said first essentially optically transparent layer.

11. A planar optical structure for generating an evanescent-field measuring platform according to claim 3, wherein said at least one optical coupling grating comprises grating structures formed as relief gratings in a surface of said second essentially optically transparent layer facing said first essentially optically transparent wave guiding layer and are made by transfer to at least the surface of said first essentially optically transparent wave guiding layer.

12. A planar optical structure for generating an evanescent-field measuring platform according to claim 3, further comprising biological, biochemical or synthetic recognition elements for at least one of qualitative and quantitative detection of one or more analytes in samples brought into contact with said recognition elements.

13. A planar optical structure for generating an evanescent-field measuring platform according to claim 12, wherein said recognition elements are deposited on a surface of said first essentially optically transparent layer.

14. A planar optical structure for generating an evanescent-field measuring platform according to claim 12, wherein said recognition elements are deposited on an adhesion promoting layer that is on a surface of said first essentially optically transparent layer.

15. A planar optical structure for generating an evanescent-field measuring platform according to claim 3, wherein recesses are formed in said first essentially optically transparent waveguiding layer to create sample compartments.

16. A planar optical structure for generating an evanescent-field measuring platform according to claim 1, wherein large-area grating structures extend over extensive surface areas of said planar optical structure.

17. A planar optical structure for generating an evanescent-field measuring platform according to claim 1, wherein large-area grating structures extend over the entire surface areas of said planar optical structure.

18. A planar optical structure for generating an evanescent-field measuring platform according to claim 1, wherein said at least one of a metal layer and an essentially optically transparent wave guiding layer includes said metal layer, wherein multiple grating structures are provided on a common, continuous substrate of said metal layer.

19. A planar optical structure for generating an evanescent-field measuring platform according to claim 1, comprising a superposition of two or more grating structures of differing periodicity with a parallel or nonparallel arrangement of grating lines thereof.

20. A planar optical structure for generating an evanescent-field measuring platform according to claim 1, wherein at least one grating structure thereof has a three-dimensionally varying periodicity that is essentially perpendicular to a direction of propagation of the excitation light in-coupled into said first essentially optically transparent layer.

21. A planar optical structure for generating an evanescent-field measuring platform according to claim 1, wherein at least one grating structure thereof has a period of 200 nm-1000 nm.

22. A planar optical structure for generating an evanescent-field measuring platform according to claim 1, wherein the resonance angle for in-coupling and out-coupling of a monochromatic excitation light within an area of a grating structure thereof of at least 4 mm² or over a distance of at least 2 mm in parallel with grating lines of the grating structure does not vary by more than 0.1 deviation from a mean value.

23. A planar optical structure for generating an evanescent-field measuring platform according to claim 1, wherein grating structures thereof are relief gratings having a profile.

24. A planar optical structure for generating an evanescent-field measuring platform according to claim 1, wherein outer dimensions of a base area of said planar optical structure are about 8 cm×

12 cm and said planar optical structure has 96,384 or 1536 wells.

25. A planar optical structure for generating an evanescent-field measuring platform according to claim 1, further comprising identifiable markings to facilitate adjustment in an optical system or the connection of said planar optical structure to a further body for creating one or more sample compartments.