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Plasma processing chamber with enhanced gas delivery

  • US 8,382,939 B2
  • Filed: 07/13/2009
  • Issued: 02/26/2013
  • Est. Priority Date: 07/13/2009
  • Status: Active Grant
First Claim
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1. A vacuum processing chamber, comprising:

  • a chamber body having an interior volume;

    a substrate support pedestal disposed in the interior volume;

    a lid enclosing the interior volume;

    a gas distribution plate positioned below the lid and above the substrate support pedestal;

    a vortex inducing gas inlet oriented to induce a vortex of gas circulating in a plenum around a center line of the chamber body prior to the gas passing through the gas distribution plate; and

    a vortex confinement ring disposed in the plenum and having a channel plenum aligned with and accepting gas from the vortex inducing gas inlet, wherein the vortex confinement ring further comprises a main body having the channel plenum formed therein, the main body having an inner wall bounding the channel plenum, the inner wall having a plurality of holes allowing fluid communication between the channel plenum and the plenum defined between the gas distribution plate and the lid.

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