Plasma processing chamber with enhanced gas delivery
First Claim
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1. A vacuum processing chamber, comprising:
- a chamber body having an interior volume;
a substrate support pedestal disposed in the interior volume;
a lid enclosing the interior volume;
a gas distribution plate positioned below the lid and above the substrate support pedestal;
a vortex inducing gas inlet oriented to induce a vortex of gas circulating in a plenum around a center line of the chamber body prior to the gas passing through the gas distribution plate; and
a vortex confinement ring disposed in the plenum and having a channel plenum aligned with and accepting gas from the vortex inducing gas inlet, wherein the vortex confinement ring further comprises a main body having the channel plenum formed therein, the main body having an inner wall bounding the channel plenum, the inner wall having a plurality of holes allowing fluid communication between the channel plenum and the plenum defined between the gas distribution plate and the lid.
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Abstract
A method and apparatus for providing flow into a processing chamber are provided. In one embodiment, a vacuum processing chamber is provided that includes a substrate support pedestal disposed in an interior volume of a chamber body, a lid enclosing the interior volume, a gas distribution plate positioned below the lid and above the substrate support pedestal, and a vortex inducing gas inlet oriented to induce a vortex of gas circulating in a plenum around a center line of the chamber body prior to the gas passing through the gas distribution plate.
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Citations
12 Claims
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1. A vacuum processing chamber, comprising:
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a chamber body having an interior volume; a substrate support pedestal disposed in the interior volume; a lid enclosing the interior volume; a gas distribution plate positioned below the lid and above the substrate support pedestal; a vortex inducing gas inlet oriented to induce a vortex of gas circulating in a plenum around a center line of the chamber body prior to the gas passing through the gas distribution plate; and a vortex confinement ring disposed in the plenum and having a channel plenum aligned with and accepting gas from the vortex inducing gas inlet, wherein the vortex confinement ring further comprises a main body having the channel plenum formed therein, the main body having an inner wall bounding the channel plenum, the inner wall having a plurality of holes allowing fluid communication between the channel plenum and the plenum defined between the gas distribution plate and the lid. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A vacuum processing chamber, comprising:
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a chamber body having an interior volume; a substrate support pedestal disposed in the interior volume; a lid enclosing the interior volume; a gas distribution plate positioned below the lid and above the substrate support pedestal; a plenum defined between the gas distribution plate and the lid; a vortex inducing gas inlet oriented to induce a vortex of gas circulating in the plenum prior to the gas passing through the gas distribution plate; and a vortex confinement ring disposed in the plenum and having a channel plenum aligned with and accepting gas from the vortex inducing gas inlet, wherein the vortex confinement ring further comprises a main body having the channel plenum formed therein, the main body having an inner wall bounding the channel plenum, the inner wall having a plurality of holes allowing fluid communication between the channel plenum and the plenum defined between the gas distribution plate and the lid. - View Dependent Claims (10, 11, 12)
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Specification