Semiconductor device and manufacturing method thereof
First Claim
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1. A method of manufacturing a semiconductor device, the method comprising;
- forming a nitride semiconductor layer;
forming a first conductive layer on the nitride semiconductor layer, the first conductive layer comprising a first element and a second element, the first element having a Gibbs free energy of nitride formation lower than those of the second element or any element in the nitride semiconductor layer;
forming a second conductive layer on the first conductive layer, the second conductive layer comprising the second element; and
nitrogenizing the first element near an interface region between the first conductive layer and the nitride semiconductor layer.
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Abstract
An oxide or nitride semiconductor layer is formed over a substrate. A first conductive layer including a first element and a second element, and a second conductive layer including the second element are formed over the semiconductor layer. The first element is oxidized or nitrogenized near an interface region between the first conductive layer and the oxide or nitride semiconductor layer by heat treatment or laser irradiation. The Gibbs free energy of oxide formation of the first element is lower than those of the second element or any element in the oxide or nitride semiconductor layer.
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7 Claims
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1. A method of manufacturing a semiconductor device, the method comprising;
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forming a nitride semiconductor layer; forming a first conductive layer on the nitride semiconductor layer, the first conductive layer comprising a first element and a second element, the first element having a Gibbs free energy of nitride formation lower than those of the second element or any element in the nitride semiconductor layer; forming a second conductive layer on the first conductive layer, the second conductive layer comprising the second element; and nitrogenizing the first element near an interface region between the first conductive layer and the nitride semiconductor layer. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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Specification