Method for providing electrical connections to spaced conductive lines
First Claim
1. A method of fabricating an integrated circuit structure on a support structure, the method comprising:
- forming a self-assembled block copolymer material comprising a first polymer and spaced material lines of a second polymer;
removing said first polymer from said self-assembled block copolymer material;
cutting said spaced material lines at an angle relative to a linearly extending direction to form respective angled end faces at each of the spaced material lines, said respective angled end faces being spaced in the linearly extending direction;
forming an extension of each of said spaced material lines at each respective angled end face.
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Accused Products
Abstract
An integrated circuit and a method of formation provide a contact area formed at an angled end of at least one linearly extending conductive line. In an embodiment, conductive lines with contact landing pads are formed by patterning lines in a mask material, cutting at least one of the material lines to form an angle relative to the extending direction of the material lines, forming extensions from the angled end faces of the mask material, and patterning an underlying conductor by etching using said material lines and extension as a mask. In another embodiment, at least one conductive line is cut at an angle relative to the extending direction of the conductive line to produce an angled end face, and an electrical contact landing pad is formed in contact with the angled end face.
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Citations
20 Claims
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1. A method of fabricating an integrated circuit structure on a support structure, the method comprising:
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forming a self-assembled block copolymer material comprising a first polymer and spaced material lines of a second polymer; removing said first polymer from said self-assembled block copolymer material; cutting said spaced material lines at an angle relative to a linearly extending direction to form respective angled end faces at each of the spaced material lines, said respective angled end faces being spaced in the linearly extending direction; forming an extension of each of said spaced material lines at each respective angled end face. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A method of fabricating an integrated circuit structure on a support structure, the method comprising:
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forming a plurality of linearly extending lines of a block copolymer material; etching a conductive material provided below said linearly extending lines using said linearly extending lines as an etch mask to form conductive lines; cutting said conductive lines at an angle relative to a linearly extending direction to form respective angled end faces at each of the conductive lines, said respective angled end faces being spaced in the linearly extending direction; and forming an extension of each of said conductive lines at each respective angled end face. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19, 20)
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Specification