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Precursors for CVD silicon carbo-nitride films

  • US 8,383,849 B2
  • Filed: 03/18/2011
  • Issued: 02/26/2013
  • Est. Priority Date: 05/16/2005
  • Status: Active Grant
First Claim
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1. A composition for depositing a dielectric film comprising:

  • an aminosilane comprising the following formula A;

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