Semiconductor device and method for manufacturing semiconductor device

• US 8,384,209 B2
• Filed: 04/24/2009
• Issued: 02/26/2013
• Est. Priority Date: 05/12/2008
• Status: Expired due to Fees

• Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
• Original Assignee: Semiconductor Energy Laboratory Co., Ltd.
• Inventors: Oikawa, Yoshiaki, Eguchi, Shingo, Yamazaki, Shunpei
• Primary Examiner(s): Luu, Chuong A.
• Application Number:
  US12/429,202
• Publication Number:
  US 20090278252A1
• Time in Patent Office: 1,404 Days
• Field of Search: 257/702, 257/40, 257/43, 257/98, 257/642, 257/643, 257/759
• US Class Current: 257/702
• CPC Class Codes: H01L 21/71 Manufacture of specific parts of devices defined in group H01L21/70 H01L21/0405, H01L21/0445 , H01L21/28, H01L21/44, H01L21/48 take precedence
• CPC Class Codes: H01L 23/293 Organic, e.g. plastic
• CPC Class Codes: H01L 23/3157 Partial encapsulation or coating mask layer used as insulation layer H01L21/31
• CPC Class Codes: H01L 2924/00 Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
• CPC Class Codes: H01L 2924/0002 Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
• CPC Class Codes: H01L 2924/12044 OLED
• CPC Class Codes: H01L 2924/19041 being a capacitor

Abstract

To reduce defects of a semiconductor device, such as defects in shape and characteristic due to external stress and electrostatic discharge. To provide a highly reliable semiconductor device. In addition, to increase manufacturing yield of a semiconductor device by reducing the above defects in the manufacturing process. The semiconductor device includes a semiconductor integrated circuit sandwiched by impact resistance layers against external stress and an impact diffusion layer diffusing the impact and a conductive layer covering the semiconductor integrated circuit. With the use of the conductive layer covering the semiconductor integrated circuit, electrostatic breakdown (malfunctions of the circuit or damages of a semiconductor element) due to electrostatic discharge of the semiconductor integrated circuit can be prevented.

Claims

1. A semiconductor device comprising:

a conductive layer;

a first layer over the conductive layer, the first layer including a first organic resin and a first fibrous body;

a second layer over the first layer;

a third layer over the second layer, the third layer including a second organic resin and a second fibrous body;

a fourth layer over the third layer; and

a semiconductor integrated circuit between the second layer and the third layer,

wherein the second layer has a lower modulus of elasticity and higher breaking strength than the first layer, and

wherein the fourth layer has a lower modulus of elasticity and higher breaking strength than the third layer.

2. The semiconductor device according to claim 1, further comprising an antenna electrically connected to the semiconductor integrated circuit,

wherein the antenna is interposed between the semiconductor integrated circuit and the third layer.

3. The semiconductor device according to claim 2, further comprising an inorganic insulating layer between the antenna and the first layer.

4. The semiconductor device according to claim 1, wherein the conductive layer and the semiconductor integrated circuit are electrically insulated from each other.

5. The semiconductor device according to claim 1, wherein each of the second layer and the fourth layer includes an aramid resin.

6. The semiconductor device according to claim 1, wherein each of the first fibrous body in the first layer and the second fibrous body in the third layer is a woven or nonwoven fabric.

7. The semiconductor device according to claim 1, wherein each of the first organic resin in the first layer and the second organic resin in the third layer is selected from the group consisting of an epoxy resin, an unsaturated polyester resin, a polyimide resin, a bismaleimide-triazine resin, a cyanate resin, a polyphenylene oxide resin, a polyetherimide resin, and a fluorine resin.

8. The semiconductor device according to claim 1, wherein each of the second layer and the fourth layer has a modulus of elasticity of from 5 GPa to 12 GPa and a modulus of rupture of 300 MPa or more.

9. The semiconductor device according to claim 1, wherein the conductive layer is on an entire surface of a region overlapped with the semiconductor integrated circuit.

10. A semiconductor device comprising:

a conductive layer;

a first layer over the conductive layer;

a second layer over the conductive layer, the second layer including a first fibrous body and a first organic resin;

a third layer over the second layer, the third layer including a second fibrous body and a second organic resin;

a fourth layer over the third layer; and

a semiconductor integrated circuit between the second layer and the third layer,

wherein the first layer has a lower modulus of elasticity and higher breaking strength than the second layer, and

wherein the fourth layer has a lower modulus of elasticity and higher breaking strength than the third layer.

11. The semiconductor device according to claim 10, further comprising an antenna electrically connected to the semiconductor integrated circuit,

wherein the antenna is interposed between the semiconductor integrated circuit and the third layer.

12. The semiconductor device according to claim 11, further comprising an inorganic insulating layer between the antenna and the first layer.

13. The semiconductor device according to claim 10, wherein the conductive layer and the semiconductor integrated circuit are electrically insulated from each other.

14. The semiconductor device according to claim 10, wherein each of the first layer and the fourth layer includes an aramid resin.

15. The semiconductor device according to claim 10, wherein each of the first fibrous body in the second layer and the second fibrous body in the third layer is a woven or nonwoven fabric.

16. The semiconductor device according to claim 10, wherein each of the first organic resin in the second layer and the second organic resin in the third layer is selected from the group consisting of an epoxy resin, an unsaturated polyester resin, a polyimide resin, a bismaleimide-triazine resin, a cyanate resin, a polyphenylene oxide resin, a polyetherimide resin, and a fluorine resin.

17. The semiconductor device according to claim 10, wherein each of the first layer and the fourth layer has a modulus of elasticity of from 5 GPa to 12 GPa and a modulus of rupture of 300 MPa or more.

18. The semiconductor device according to claim 10, wherein the conductive layer is on an entire surface of a region overlapped with the semiconductor integrated circuit.