Exposure apparatus, exposure method, and method for producing device
First Claim
1. An exposure apparatus comprising:
- a mask-moving section which holds a mask formed with a pattern and which is movable in a first direction;
an illumination system which irradiates an exposure light onto the mask held by the mask-moving section and which forms a first illumination area and a second illumination area separated from each other by a spacing distance in the first direction;
a substrate-moving section which holds a photosensitive substrate and which is movable in a second direction corresponding to the first direction and in synchronization with the mask-moving section;
a projection optical system which forms a first projected image of the pattern positioned in the first illumination area and a second projected image of the pattern positioned in the second illumination area, on the photosensitive substrate held by the substrate-moving section; and
a restricting section which restricts the first projected image and the second projected image on the photosensitive substrate to be within a first projection area and a second projection area respectively on the photosensitive substrate;
wherein an area-to-area spacing distance, in the first direction, between a first conjugate area optically conjugate with the first projection area via the projection optical system and a second conjugate area optically conjugate with the second projection area via the projection optical system is set to be such a spacing distance that scanning exposures with a whole of the pattern with respect to a first transfer area and a second transfer area provided adjacently in the second direction on the photosensitive substrate are successively performed corresponding to synchronous movement of the mask-moving section and the substrate-moving section, each of the first transfer area and the second transfer area corresponding to the whole of the pattern and the first and second transfer areas being exposed by one time of scanning exposure between a step movement and the next step movement.
1 Assignment
0 Petitions
Accused Products
Abstract
An exposure apparatus includes a mask-moving section movable in a first direction while holding a mask formed with a pattern; an illumination system which forms first and second illumination areas separated each other by a spacing distance in the first direction; a substrate-moving section movable in a second direction while holding a photosensitive substrate; a projection optical system which forms first and second projected images of the patterns of the first and second illumination areas; and a restricting section which restricts the first and second projected images to be within first and second projection areas respectively. A spacing distance between a first conjugate area with the first projection area and a second conjugate area with the second projection area is set to be such a spacing distance that scanning exposures are successively performed for first and second transfer areas provided adjacently in the second direction.
23 Citations
40 Claims
-
1. An exposure apparatus comprising:
-
a mask-moving section which holds a mask formed with a pattern and which is movable in a first direction; an illumination system which irradiates an exposure light onto the mask held by the mask-moving section and which forms a first illumination area and a second illumination area separated from each other by a spacing distance in the first direction; a substrate-moving section which holds a photosensitive substrate and which is movable in a second direction corresponding to the first direction and in synchronization with the mask-moving section; a projection optical system which forms a first projected image of the pattern positioned in the first illumination area and a second projected image of the pattern positioned in the second illumination area, on the photosensitive substrate held by the substrate-moving section; and a restricting section which restricts the first projected image and the second projected image on the photosensitive substrate to be within a first projection area and a second projection area respectively on the photosensitive substrate; wherein an area-to-area spacing distance, in the first direction, between a first conjugate area optically conjugate with the first projection area via the projection optical system and a second conjugate area optically conjugate with the second projection area via the projection optical system is set to be such a spacing distance that scanning exposures with a whole of the pattern with respect to a first transfer area and a second transfer area provided adjacently in the second direction on the photosensitive substrate are successively performed corresponding to synchronous movement of the mask-moving section and the substrate-moving section, each of the first transfer area and the second transfer area corresponding to the whole of the pattern and the first and second transfer areas being exposed by one time of scanning exposure between a step movement and the next step movement. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25)
-
-
26. An exposure apparatus which exposes a substrate with an image of a pattern formed on a mask, the exposure apparatus comprising:
-
an illumination system which forms a first illumination area and a second illumination area, with a spacing distance, on a plane same as the mask; a mask-moving section which is movable continuously while holding the mask to make the pattern pass successively through the first illumination area and the second illumination area; a projection system which projects a first image and a second image on the substrate, the first image and the second image being formed when the pattern passes through the first illumination area and the second illumination area, respectively; and a substrate-moving section which is movable continuously, while holding the substrate, in a direction corresponding to movement of the mask-moving section and in synchronization with the movement of the mask-moving section to successively form an image of a whole of the pattern with the first image and the image of the whole of the pattern with the second image in different areas, respectively, on the substrate, by one time of scanning exposure between a step movement and the next step movement. - View Dependent Claims (27, 28, 29)
-
-
30. An exposure method comprising:
-
irradiating an exposure light onto a mask formed with a pattern to form a first illumination area and a second illumination area which are separated from each other by a spacing distance in a first direction; forming, on a photosensitive substrate, a first projected image of the pattern positioned in the first illumination area and a second projected image of the pattern positioned in the second illumination area; and synchronously moving the mask and the photosensitive substrate in the first direction and a second direction corresponding to the first direction respectively to successively perform scanning exposures with a whole of the pattern with respect to a first transfer area and a second transfer area, which are provided adjacently in the second direction on the photosensitive substrate, each of the first transfer area and the second transfer area corresponding to the whole of the pattern and the first and second transfer areas being exposed by one time of scanning exposure between a step movement and the next step movement. - View Dependent Claims (31, 32, 33, 34, 35)
-
-
36. An exposure method for exposing a substrate with an image of a pattern formed on a mask, the exposure method comprising:
-
forming a first illumination area and a second illumination area, with a spacing distance, on a plane same as the mask; moving the mask continuously relative to the first illumination area and the second illumination area to make the pattern pass successively through the first illumination area and the second illumination area; projecting a first image and a second image on the substrate, the first image and the second image being formed when the pattern passes through the first illumination area and the second illumination area, respectively; and moving the substrate continuously in a direction corresponding to movement of the mask and in synchronization with the movement of the mask to successively form an image of a whole of the pattern with the first image and the image of the whole of the pattern with the second image in different areas, respectively, on the substrate, by one time of scanning exposure between a step movement and the next step movement. - View Dependent Claims (37, 38, 39, 40)
-
Specification