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Exposure method, substrate stage, exposure apparatus, and device manufacturing method

  • US 8,384,880 B2
  • Filed: 09/10/2008
  • Issued: 02/26/2013
  • Est. Priority Date: 06/13/2003
  • Status: Expired due to Fees
First Claim
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1. A substrate stage apparatus used in a liquid immersion exposure in which a substrate is exposed by projecting an image of a pattern onto the substrate via a projection optical system and a liquid, comprising:

  • a movable stage which holds the substrate, the movable stage including a substrate holder to hold the substrate, a flat portion, and an inner side surface provided below the flat portion,wherein at least a part of the inner side surface includes a surface of a fluoroplastic material,the inner side surface faces an edge of the substrate held by the substrate holder, andat least a part of the surface of the fluoroplastic material of the inner side surface is disposed so as to suppress a flow of the liquid through a first gap between the inner side surface and the edge of the substrate held by the substrate holder.

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