Exposure apparatus, exposure method, and method for producing device
First Claim
1. An exposure apparatus which exposes a substrate, comprising:
- an optical system which includes a plurality of optical elements, which forms an image of a first pattern in a first exposure area and which forms an image of a second pattern in a second exposure area, the second pattern being different from the first pattern;
a first detecting system which obtains at least one of position information about the image of the first pattern to be formed in the first exposure area and position information about the image of the second pattern to be formed in the second exposure area; and
a reference which is arranged on a light-exit side of an optical element of the plurality of optical elements, the optical element being arranged closest to the first exposure area or the second exposure area;
wherein a predetermined area on the substrate is subjected to multiple exposure with the image of the first pattern formed in the first exposure area and the image of the second pattern formed in the second exposure area;
the first detecting system detects at least one of a first positional relationship between the first pattern and the reference and a second positional relationship between the second pattern and the reference, via at least a part of the optical system; and
at least one of the position information about the image of the first pattern to be formed in the first exposure area and the position information about the image of the second pattern to be formed in the second exposure area is obtained based on a detection result of the first detecting system and thereby a positional relationship between the first pattern and the second pattern is adjusted.
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Accused Products
Abstract
An exposure apparatus includes a projection optical system which is capable of forming an image of a first pattern in a first exposure area and which is capable of forming an image of a second pattern in a second exposure area, the second pattern being different from the first pattern, and a first detecting system which obtains at least one of position information about the image of the first pattern and position information about the image of the second pattern. A positional relationship between the images of the first and second patterns and a predetermined area on a substrate is adjusted based on a detection result to perform multiple exposure for the predetermined area on the substrate with the images of the first and second patterns. The substrate can be subjected to the multiple exposure efficiently.
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Citations
47 Claims
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1. An exposure apparatus which exposes a substrate, comprising:
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an optical system which includes a plurality of optical elements, which forms an image of a first pattern in a first exposure area and which forms an image of a second pattern in a second exposure area, the second pattern being different from the first pattern; a first detecting system which obtains at least one of position information about the image of the first pattern to be formed in the first exposure area and position information about the image of the second pattern to be formed in the second exposure area; and a reference which is arranged on a light-exit side of an optical element of the plurality of optical elements, the optical element being arranged closest to the first exposure area or the second exposure area; wherein a predetermined area on the substrate is subjected to multiple exposure with the image of the first pattern formed in the first exposure area and the image of the second pattern formed in the second exposure area; the first detecting system detects at least one of a first positional relationship between the first pattern and the reference and a second positional relationship between the second pattern and the reference, via at least a part of the optical system; and at least one of the position information about the image of the first pattern to be formed in the first exposure area and the position information about the image of the second pattern to be formed in the second exposure area is obtained based on a detection result of the first detecting system and thereby a positional relationship between the first pattern and the second pattern is adjusted. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35)
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36. An exposure method for performing multiple exposure for a substrate with an image of a first pattern and an image of a second pattern different from the first pattern, the exposure method comprising:
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forming the image of the first pattern in a first exposure area; forming the image of the second pattern in a second exposure area; obtaining at least one of position information about the image of the first pattern to be formed in the first exposure area and position information about the image of the second pattern to be formed in the second exposure area and thereby a positional relationship between the first pattern and the second pattern is adjusted; and performing the multiple exposure for a predetermined area on the substrate with the image of the first pattern and the image of the second pattern based on at least one of the obtained position informations; wherein the images of the first and second patterns are formed via an optical system which includes a plurality of optical elements, a first positional relationship of the first pattern with respect to a reference arranged on a light-exit side of an optical element of the plurality of optical elements, the optical element being arranged closest to the first exposure area or the second exposure area and a second positional relationship of the second pattern with respect to the reference are detected via at least a part of the optical system, and at least one of the position information about the image of the first pattern and the position information about the image of the second pattern is obtained based on a result of the detection. - View Dependent Claims (37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47)
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Specification