Method of measuring the position of a mask surface along the height direction, exposure device, and exposure method
First Claim
Patent Images
1. An exposure device for exposing a photosensitive substrate with a reflection mask pattern, comprising:
- a projection optical system configured to project the reflection mask pattern, the projection optical system comprising an exposure area defining member configured to define a shape of light incident on the photosensitive substrate;
a height-direction position measuring device configured to measure a height position of the reflection mask at a position where a measuring light is not obstructed by the exposure area defining member, and configured to measure a measurement area defined on the mask that is greater than the area of the shape of light defined by the exposure area defining member wherein the measuring light reaches a surface of the mask which includes the area of the shape of light defined by the exposure area defining member and a peripheral region of the area of the shape of light defined by the exposure area defining member; and
a mover configured to move the reflection mask according to the height position of the reflection mask as measured by the height-direction position measuring device.
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Abstract
A method to measure the height-direction position of a mask M in an exposure device having a function to irradiate the mask M with light emitted from a light source and transfer a pattern formed on the mask M onto a photosensitive substrate such as a wafer by a projection optical system, a mask surface height-direction position measurement method characterized by moving, before measuring the height-direction position of the mask M, an exposure area defining member 1 which is installed between the mask M and the projection optical system and defines an exposure area at the time of exposure.
9 Citations
20 Claims
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1. An exposure device for exposing a photosensitive substrate with a reflection mask pattern, comprising:
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a projection optical system configured to project the reflection mask pattern, the projection optical system comprising an exposure area defining member configured to define a shape of light incident on the photosensitive substrate; a height-direction position measuring device configured to measure a height position of the reflection mask at a position where a measuring light is not obstructed by the exposure area defining member, and configured to measure a measurement area defined on the mask that is greater than the area of the shape of light defined by the exposure area defining member wherein the measuring light reaches a surface of the mask which includes the area of the shape of light defined by the exposure area defining member and a peripheral region of the area of the shape of light defined by the exposure area defining member; and a mover configured to move the reflection mask according to the height position of the reflection mask as measured by the height-direction position measuring device.
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2. An exposure device for exposing a photosensitive substrate with a reflection mask pattern, comprising:
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a projection optical system; a height-direction position measuring device configured to measure a height position of a reflection mask; an exposure area defining member between the reflection mask and the projection optical system configured to define a shape of the light incident on the photosensitive substrate at the time of exposure; a mover configured to move the exposure defining member; and a controller configured to control the mover so as to move the exposure defining member to a first position at the time of exposure and to move the exposure area defining member to a second position where a measuring light is not obstructed by the exposure area defining member at the time of measuring the height direction position of the reflection mask wherein the measuring light reaches a surface of the mask which includes the area of the shape of light defined by the exposure area defining member and a peripheral region of the area of the shape of light defined by the exposure area defining member.
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3. An exposure device for exposing a photosensitive substrate with a reflection mask pattern, comprising:
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a projection optical system configured to project the reflection mask pattern, the projection optical system comprising an exposure area defining member configured to define a shape of light incident on the photosensitive substrate; a first measurement device comprising optical elements configured to measure the height-direction position of an area of the reflection mask that is greater than the area of the shape of light defined by the exposure area defining member at a position where a measuring light is not obstructed by the exposure area defining member wherein the measuring light reaches a surface of the mask which includes the area of the shape of light defined by the exposure area defining member and a peripheral region of the area of the shape of light defined by the exposure area defining member; a second measurement device configured to measure the height-direction position of the photosensitive substrate; and a controller configured to adjust the height-direction position of the reflection mask based on the measured height-direction position of the reflection mask, and to adjust the height-direction position of the photosensitive substrate based on the measured height-direction position of the photosensitive substrate. - View Dependent Claims (4)
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5. An exposure device for exposing a mask with light emitted from a light source and for transferring a pattern formed on the mask onto a photosensitive substrate, comprising:
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a projection optical system; a height-direction position measurement device configured to measure the height-direction position of the mask; an exposure area defining member between the mask and the projection optical system configured to define a shape of the light incident on the photosensitive substrate at the time of exposure; a movement device configured to move the exposure area defining member; and a controller configured to control the movement device so as to fix the exposure area defining member at a first position at the time of exposure and to move the exposure area defining member to a second position where a measuring light is not obstructed by the exposure area defining member at the time of measuring the height-direction position wherein the measuring light reaches a surface of the mask which includes the area of the shape of light defined by the exposure area defining member and a peripheral region of the area of the shape of light defined by the exposure area defining member.
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6. An exposure device for exposing a photosensitive substrate with a reflection mask pattern using a projection optical system, comprising:
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an exposure area defining member placed between the mask and the projection optical system and configured to define a shape of a light incident on the photosensitive substrate at the time of exposure; a mover configured to move the exposure area defining member at a height-direction measuring position, the height-direction measuring position being different from an exposure position; and a height-direction position measurement device configured to measure the height-direction position of the mask surface, wherein a measuring light of the height-direction position measurement device reaches a surface of the mask which includes the area of the shape of light defined by the exposure area defining member and a peripheral region of the area of the shape of light defined by the exposure area defining member. - View Dependent Claims (7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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Specification