Lithographic apparatus and device manufacturing method

• US 8,390,787 B2
• Filed: 04/10/2007
• Issued: 03/05/2013
• Est. Priority Date: 12/22/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Gui, Cheng-Qun, De Jager, Pieter Willem Herman, Munning Schmidt, Robert-Han
• Primary Examiner(s): NGUYEN, HUNG
• Application Number:
  US11/733,327
• Publication Number:
  US 20070242246A1
• Time in Patent Office: 2,156 Days
• Field of Search: 355/52, 355/53, 355/55, 355 67- 69, 359291-292
• US Class Current: 355/69
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70308 Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift

Abstract

A lithographic apparatus comprises an illumination system for supplying a beam of radiation, a patterning arrangement incorporating an array of individually controllable elements for imparting a pattern to the beam cross-section, a substrate table for supporting a substrate, and a projection system incorporating a microlens array for projecting the beam onto a target portion of the substrate. An error compensator is provided for supplying error correction values for compensating for the effect of positional errors in the microlens array, and a grey scale modulator is provided for supplying drive signals to controllable elements of the patterning arrangement in dependence on the error correction values in order to compensate for the effect of positional errors in the microlens array by varying the intensity of some parts of the pattern relative to other parts of the pattern.

Claims

1. An apparatus, comprising:

a pattern generator configured to emit a patterned beam; and

a projection system configured to project the patterned beam onto a target portion of a substrate and comprising a micro lens array configured to produce image spots on the target portion of the substrate,

wherein the pattern generator is driven by a drive signal based on error correction values to vary an intensity of respective ones of the image spots adjacent to respective ones of the image spots manifesting errors caused by the projection system, thereby compensating for the errors in the projection system.

2. The apparatus of claim 1, wherein:

the pattern generator comprises an array of individually controllable elements; and

the intensity of radiation transmitted by at least some of the individually controllable elements of the array is varied by the drive signal to compensate for the effect of errors in the projection system.

3. The apparatus of claim 1, wherein the varied intensity of respective parts of the patterned beam corrects for positional errors of the micro lens array.

4. The apparatus of claim 3, wherein the positional errors are substantially less than about 20 nm.

5. The apparatus of claim 1, wherein the varied intensity of respective parts of the patterned beam corrects for magnification errors of the micro lens array.

6. The apparatus of claim 1, wherein the pattern generator is disposed in an optical path of the beam of radiation between the illumination system and the substrate.

7. The apparatus of claim 1, further comprising:

a scanning system configured to move a substrate table supporting the substrate during projection of the patterned beam onto the target portion of the substrate.

8. The apparatus of claim 7, wherein:

the pattern generator comprises an array of controllable elements arranged in parallel rows; and

the scanning system is configured to move the substrate table in a scanning direction with an angle, α

, relative to the parallel rows.

9. The apparatus of claim 1, further comprising:

an error compensator configured to supply the error correction values.

10. The apparatus of claim 9, wherein the error compensator comprises:

a sensor array configured to monitor errors in a positioning of the image spots of the micro lens array.

11. The apparatus of claim 10, wherein the sensor array comprises a photodiode array.

12. The apparatus of claim 9, wherein the error compensator is configured to determine an intensity correction matrix as a function of the positions of the image spots of the micro lens array and the errors in the positioning of the image spots.

13. The apparatus of claim 12, wherein the function further comprises at least one of:

an error matrix;

a first grid pitch in a first direction;

a second grid pitch in a second direction;

a velocity of movement of the substrate relative to the micro lens array;

a refresh rate of the patterning arrangement; and

an a tilt angle between rows of the micro lens array and a scanning direction.

14. A method, comprising:

producing a patterned beam of radiation using a pattern generator;

using a micro lens array to project image spots of the patterned beam of radiation onto a target portion of a substrate;

detecting errors in a projection system; and

supplying drive signals to the pattern generator based on the detected errors to vary an intensity of respective ones of the image spots adjacent to respective ones of the image spots manifesting errors caused by the projection system, thereby compensating for the effect of the errors in the projection system.

15. The method of claim 14, wherein:

the beam is patterned using an array of individually controllable elements; and

the intensity of radiation transmitted by at least some of the controllable elements of the array of individually controllable elements is varied in order to compensate for the effect of errors in the projection system.

16. The method of claim 14, further comprising:

correcting positional errors in parts of the micro lens array.

17. The method of claim 14, further comprising:

correcting magnification errors in parts of the micro lens array.

18. The method of claim 14, further comprising:

moving a substrate table supporting the substrate during the projection of the beam onto the target portion of the substrate.

19. The method of claim 18, wherein:

the pattern generator comprises an array of controllable elements arranged in parallel rows; and

the substrate table is moved in a scanning direction with an angle, α

, relative to the parallel rows during projection of the beam onto the target portion of the substrate.

20. The method of claim 14, wherein varying the intensity of the respective portions of the patterned beam results in an overall uniform intensity of the patterned beam.

21. An apparatus, comprising:

a programmable mirror array configured to emit a patterned beam; and

a projection system configured to project image spots of the patterned beam onto a target portion of a substrate, each image spot being based on two or more mirrors from the programmable mirror array, and

wherein the programmable mirror array is driven by a drive signal based on error correction values to vary an intensity of the image spots adjacent to the image spots manifesting errors caused by the projection system, thereby compensating for the errors in the projection system.

22. A method, comprising:

producing a patterned beam of radiation using a programmable mirror array;

projecting image spots of the patterned beam of radiation onto a target portion of a substrate, each image spot being based on two or more mirrors from the programmable mirror array;

detecting errors in a projection system; and

supplying drive signals to the programmable mirror array based on the detected errors to vary an intensity of the image spots adjacent to the image spots manifesting errors caused by the projection system, thereby compensating for the effect of the errors in the projection system.