Rotating motion sensor
First Claim
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1. A rotating motion sensor comprising:
- an electroacoustic resonator comprising a transducer, the transducer comprising a piezoelectric substrate and an array of electrode strips on the piezoelectric substrate, the electroacoustic resonator to stimulate a surface acoustic wave, the electroacoustic resonator comprising oscillating structures configured to oscillate in one or both of;
(i) a first direction that is along a direction of propagation of the surface acoustic wave, and (ii) a second direction that is transverse to the direction of propagation of the surface acoustic wave, at least part of the oscillating structures being on the electrode strips and/or between the electrode strips;
wherein the electroacoustic resonator is configured so that rotation of the electroacoustic resonator about an axis of rotation causes a change in resonance frequency of the electroacoustic resonator.
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Abstract
A rotating motion sensor includes at least one electroacoustic resonator to stimulate a surface acoustic wave. The at least one electroacoustic resonator is configured so that rotation of the at least one electroacoustic resonator about an axis of rotation causes a change in resonance frequency of the at least one electroacoustic resonator. The at least one electroacoustic resonator includes oscillating structures configured to oscillate in a first direction that is a direction of propagation of the surface acoustic wave and/or a second direction that is transverse to the direction of propagation of the surface acoustic wave.
66 Citations
19 Claims
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1. A rotating motion sensor comprising:
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an electroacoustic resonator comprising a transducer, the transducer comprising a piezoelectric substrate and an array of electrode strips on the piezoelectric substrate, the electroacoustic resonator to stimulate a surface acoustic wave, the electroacoustic resonator comprising oscillating structures configured to oscillate in one or both of;
(i) a first direction that is along a direction of propagation of the surface acoustic wave, and (ii) a second direction that is transverse to the direction of propagation of the surface acoustic wave, at least part of the oscillating structures being on the electrode strips and/or between the electrode strips;wherein the electroacoustic resonator is configured so that rotation of the electroacoustic resonator about an axis of rotation causes a change in resonance frequency of the electroacoustic resonator. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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17. A rotating motion sensor comprising:
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at least one electroacoustic resonator to stimulate a surface acoustic wave, the at least one electroacoustic resonator comprising; oscillating structures configured to oscillate in one or both of;
(i) a first direction that is a direction of propagation of the surface acoustic wave, and (ii) a second direction that is transverse to the direction of propagation of the surface acoustic wave;wherein the at least one electroacoustic resonator is configured so that rotation affects operation of the at least one electroacoustic resonator; wherein at least two of the oscillating structures have different geometries; wherein at least two of the oscillating structures comprise different layer structures; and wherein the at least one electroacoustic resonator comprises different regions, the different regions comprising different densities of oscillating structures.
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18. A rotating motion sensor comprising:
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at least one electroacoustic resonator to stimulate a surface acoustic wave, the at least one electroacoustic resonator comprising oscillating structures configured to oscillate in one or both of;
(i) a first direction that is along a direction of propagation of the surface acoustic wave, and (ii) a second direction that is transverse to the direction of propagation of the surface acoustic wave;wherein each of the oscillating structures comprises at least two layers, the at least two layers comprising an upper layer and a lower layer, the upper layer being further from a substrate below the oscillating structures than the lower layer; wherein the upper layer comprises a first material and the lower layer comprises a second material, the first material having a higher density than the second material; and wherein the at least one electroacoustic resonator is configured so that rotation of the at least one electroacoustic resonator about an axis of rotation causes a change in resonance frequency of the at least one electroacoustic resonator.
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19. A rotating motion sensor comprising:
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at least one electroacoustic resonator to stimulate a surface acoustic wave, the at least one electroacoustic resonator comprising oscillating structures configured to oscillate in one or both of;
(i) a first direction that is along a direction of propagation of the surface acoustic wave, and (ii) a second direction that is transverse to the direction of propagation of the surface acoustic wave;wherein the at least one electroacoustic resonator is configured so that rotation of the at least one electroacoustic resonator about an axis of rotation causes a change in resonance frequency of the at least one electroacoustic resonator; wherein oscillation of the oscillating structures is characterized by a resonance curve; and wherein an operating frequency range for the rotating motion sensor is within a bandwidth that substantially corresponds to a half height of the resonance curve.
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Specification