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Two-dimensional arrays of holes with sub-lithographic diameters formed by block copolymer self-assembly

  • US 8,394,483 B2
  • Filed: 01/24/2007
  • Issued: 03/12/2013
  • Est. Priority Date: 01/24/2007
  • Status: Active Grant
First Claim
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1. A method for fabricating nanoscale microstructures, comprising:

  • forming a copolymer film comprising a self-assembling block copolymer within a plurality of trenches to a thickness of about Lo each trench having a width of about Lo, a length of about nLo, a pitch distance between adjacent trenches of at least about 2*Lo, preferential wetting sidewalls and ends, and a neutral wetting floor, with ends of the trenches aligned; and

    causing the copolymer film to form a single array of perpendicularly oriented cylindrical domains of a first polymer block of the block copolymer in a matrix of a second polymer block of the block copolymer within each trench of the plurality, wherein the pitch distance between each cylindrical domain within a trench is about Lo, and the pitch distance between the cylindrical domains of adjacent trenches is about 2*Lo.

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