Illumination system for a microlithographic projection exposure apparatus

• US 8,395,756 B2
• Filed: 08/12/2008
• Issued: 03/12/2013
• Est. Priority Date: 02/17/2006
• Status: Active Grant

• Current Assignee: CARL Zeiss SMT GmbH (Carl-Zeiss-Stiftung)
• Original Assignee: CARL Zeiss SMT GmbH (Carl-Zeiss-Stiftung)
• Inventors: Wangler, Johannes, Siekmann, Heiko, Scharnweber, Ralf, Maul, Manfred, Deguenther, Markus, Layh, Michael, Scholz, Axel, Weible, Kenneth, Spengler, Uwe, Voelkel, Reinhard
• Primary Examiner(s): Nguyen, Hung Henry
• Assistant Examiner(s): KREUTZER, COLIN WRIGHT
• Application Number:
  US12/190,308
• Publication Number:
  US 20090021716A1
• Time in Patent Office: 1,673 Days
• Field of Search: 355/53, 355/67, 355/71, 355/77, 359/619, 359621-624, 359/626, 359/628
• US Class Current: 355/71
• CPC Class Codes: G02B 27/0911 Anamorphotic systems
• CPC Class Codes: G02B 3/0056 arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses G02B3/0043 takes precedence; miniaturised objectives for electronic devices employing wafer level optics G02B13/0085
• CPC Class Codes: G03F 7/70058 Mask illumination systems
• CPC Class Codes: G03F 7/70075 Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
• CPC Class Codes: G03F 7/70083 Non-homogeneous intensity distribution in the mask plane
• CPC Class Codes: G03F 7/70158 Diffractive optical elements
• CPC Class Codes: G03F 7/70191 Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like

Abstract

Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.

Claims

1. A system, comprising:

an optical integrator configured so that, when light impinges thereon, the optical integrator produces secondary light sources;

a scattering structure comprising pseudo-randomly configured subelements; and

a condenser,

wherein;

at least one of the subelements comprises a microlens;

each subelement is configured so that, when light impinges thereon, each subelement substantially increases a geometrical optical flux of light only in one direction;

the system is an illumination system configured to be used in a microlithographic projection exposure apparatus;

the scattering structure is arranged, along a light propagation direction of the system, behind the optical integrator;

the scattering structure is arranged between the optical integrator and the condenser; and

the condenser is arranged between the optical integrator and a field plane.

2. The system of claim 1, wherein the scattering structure comprises first pseudo-randomly configured subelements and second pseudo-randomly configured subelements, each of the first pseudo-randomly being configured to substantially increase the geometrical optical flux of light only in a first direction, and each of the second pseudo-randomly being configured to substantially increase the geometrical optical flux of light only in a second direction different from the first direction.

3. The system of claim 2, wherein the first direction is at least substantially perpendicular to the second direction.

4. The system of claim 1, wherein the subelements are arranged in a non-periodic array.

5. The system of claim 1, wherein at least two subelements have different dimensions along at least one direction.

6. The system of claim 1, wherein at least two subelements have a different inner structure.

7. The system of claim 6, wherein different inner structures are defined by relatively shifting a predetermined structure perpendicularly to an optical axis of the system.

8. The system of claim 6, wherein different structures are defined by scaling a predetermined structure.

9. The system of claim 1, wherein at least one subelement has a pitch that varies along at least one direction.

10. The system of claim 9, wherein the at least one direction is a longitudinal direction of the at least one subelement.

11. The system of claim 1, wherein the optical integrator comprises a plurality of integrator elements, and, in a direction perpendicular to an optical axis of the system, the integrator elements have a first pitch and the subelements have a second pitch.

12. The system of claim 11, wherein the first pitch is less than 1000 μ

m.

13. The system of claim 11, wherein the first pitch is less than 600 μ

m.

14. The system of claim 11, wherein the second pitch is less than the first pitch.

15. The system of claim 1, wherein at least one of the subelements comprises a diffractive optical element.

16. The illumination system of claim 1, wherein the microlens has a cylindrical shape.

17. The system of claim 16, wherein at least two adjacent subelements each comprise a microlens, the microlenses of the at least two adjacent subelements are separated by flat areas having constant or varying widths, and the flat areas produce angular distributions as a result of diffractive effects.

18. The system of claim 1, wherein the microlens has a toric shape.

19. The system of claim 1, wherein each subelement is configured to produce a substantially rectangular angular light distribution.

20. The system of claim 1, wherein the scattering structure is configured to produce a near field irradiance distribution having a maximum contrast that is less than 5% higher than the contrast produced by speckles.

21. The system of claim 1, wherein the optical integrator comprises a plurality of integrator elements having shapes that are defined by first borderlines, the subelements have shapes defined by second borderlines, the first borderlines and the second borderlines form an angle α

therebetween, and 0.1°

<

α

<

89.9°

.

22. The system of claim 1, wherein the scattering structure is configured to produce, together with the optical integrator, an irradiance distribution in a mask plane along the one direction having transition zones between a zero irradiance level and a top irradiance level, and the transitions zones have dimensions along the one direction of more than 1 mm.

23. The system of claim 22, wherein the transition zones have dimensions along the one direction of more than 2.5 mm.

24. The system of claim 1, wherein the subelements produce, along the one direction, an angular light distribution with smooth transitions between a zero level and a constant top level.

25. The system of claim 24, wherein the transitions substantially have a Gaussian slope shape.

26. The system of claim 25, wherein a Gaussian angular distribution is approximated by a superposition of a plurality of substantially rectangular angular distributions of different width.

27. The system of claim 26, wherein the subelements are cylindrical microlenses having different pitches.

28. The system of claim 1, further comprising second subelements, wherein each second subelement is configured so that, when light impinges thereo, each second subelement substantially increases the geometrical optical flux only in second direction different from the one direction.

29. The system of claim 28, wherein the first and the second subelements are arranged on different supports that are configured to be rotatable relative to one another around an axis of rotation that is substantially parallel to an optical axis of the illumination system.

30. The system of claim 28, wherein the one direction and the second direction are not orthogonal.

31. The system of claim 28, wherein neither the one direction nor the second direction is parallel to a scan direction of the projection exposure apparatus.

32. The system of claim 31, further comprising a manipulator for commonly changing the one direction and the second direction.

33. The system of claim 31, further comprising a manipulator for independently changing the one direction and the further direction.

34. The system of claim 1, wherein the scattering structure is configured to modify the angular light distribution in a way that would be obtained, in the absence of the at least one scattering structure, by enlarging secondary light sources such that they abut or overlap.

35. An apparatus, comprising:

the system of claim 1,

wherein the apparatus is a projection exposure apparatus.

36. A method, comprising:

using a microlithographic exposure apparatus to fabricate a microstructured device,

wherein the microlithographic exposure apparatus comprises the system of claim 1.

37. A system, comprising:

an optical integrator; and

at least one scattering structure comprising a plurality of subelements that are configured so that, when light impinges thereon, the subelements produce rectangular angular light distributions having different angular widths; and

a condenser,

wherein;

the system is an illumination system configured to be used in a microlithographic projection exposure apparatus,

the scattering structure is arranged, along a light propagation direction of the system, behind the optical integrator;

the scattering structure is arranged between the optical integrator and the condenser; and

the condenser is arranged between the optical integrator and a field plane.

38. An apparatus, comprising:

the system of claim 37,

wherein the apparatus is a projection exposure apparatus.

39. A method, comprising:

using a microlithographic exposure apparatus to fabricate a microstructured device,

wherein the microlithographic exposure apparatus comprises the system of claim 37.

40. A system, comprising:

an optical integrator configured so that, when light impinges thereon, the optical integrator produces secondary light sources;

a scattering structure comprising pseudo-randomly configured subelements; and

a condenser,

wherein;

each subelement is configured so that, when light impinges thereon, each subelement substantially increases a geometrical optical flux of light only in one direction;

at least one subelement has a pitch that varies along at least one direction;

the system is a illumination system configured to be used in a microlithographic projection exposure apparatus;

the scattering structure is arranged, along a light propagation direction of the system, behind the optical integrator;

the scattering structure is arranged between the optical integrator and the condenser; and

the condenser is arranged between the optical integrator and a field plane.

41. The system of claim 40, wherein the at least one direction is longitudinal direction of the at least one subelement.

42. A system, comprising:

an optical integrator configured so that, when light impinges thereon, the optical integrator produces secondary light sources;

a scattering structure comprising pseudo-randomly configured subelements; and

a condenser,

wherein;

each subelement is configured so that, when light impinges thereon, each subelement substantially increases a geometrical optical flux of light only in one direction;

the system is an illumination system configured to be used in a microlithographic projection exposure apparatus;

the scattering structure is arranged between the optical integrator and the condenser;

the condenser is arranged between the optical integrator and a field plane; and

the optical integrator comprises a plurality of integrator elements having shapes that are defined by first borderlines, the subelements have shapes defined by second borderlines, the first borderlines and the second borderlines form an angle α

therebetween, and 0.1°

<

α

<

89.9°

.

43. A system, comprising:

an optical integrator configured so that, when light impinges thereon, the optical integrator produces secondary light sources;

a scattering structure comprising pseudo-randomly configured subelements; and

a condenser,

wherein;

each subelement is configured so that, when light impinges thereon, each subelement substantially increases a geometrical optical flux of light only in one direction;

the subelements produce, along the one direction, an angular light distribution with smooth transitions between a zero level and a constant top level;

the transitions substantially have a Gaussian slope shape;

a Gaussian angular distribution is approximated by a superposition of a plurality of substantially rectangular angular distributions of different width;

the system is an illumination system configured to be used in a microlithographic projection exposure apparatus;

the scattering structure is arranged, along a light propagation direction of the system, behind the optical integrator;

the scattering structure is arranged between the optical integrator and the condenser; and

the condenser is arranged between the optical integrator and a field plane.

44. The system of claim 43, wherein the subelements are arranged in a non-periodic array.

45. The system of claim 43, wherein at least two subelements have different dimensions along at least one direction.

46. The system of claim 43, wherein the scattering structure is configured to produce a near field irradiance distribution having a maximum contrast that is less than 5% higher than the contrast produced by speckles.

47. The system of claim 43, wherein the scattering structure is configured to produce, together with the optical integrator, an irradiance distribution in a mask plane along the one direction having transition zones between a zero irradiance level and a top irradiance level, and the transitions zones have dimensions along the one direction of more than 1 mm.

48. The system of claim 43, wherein the subelements are cylindrical microlenses having different pitches.

49. The system of claim 43, wherein the scattering structure is configured to modify the angular light distribution is a way that would be obtained, in the absence of the at least one scattering structure, by enlarging secondary light sources such that they abut or overlap.