Method and structure for processing thin film PV cells with improved temperature uniformity
First Claim
1. An apparatus for reactive thermal treatment of thin film photovoltaic devices, the apparatus comprising:
- a furnace tube including an inner wall extended from a first end to a second end;
a gas supply device coupled to the second end and configured to fill one or more working gases into the furnace tube;
a cover configured to seal the furnace tube at the first end and serve as a heat sink for the one or more working gases;
a fixture mechanically attached to the cover, the fixture being configured to load an array of substrates into the furnace tube as the cover seals the furnace tube; and
a shaped baffle member disposed seamlessly at a lower portion of the inner wall for blocking a convection current of the one or more working gases cooled by the cover.
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Accused Products
Abstract
An apparatus for reactive thermal treatment of thin film photovoltaic devices includes a furnace tube including an inner wall extended from a first end to a second end. The apparatus further includes a gas supply device coupled to the second end and configured to fill one or more working gases into the furnace tube. Additionally, the apparatus includes a cover configured to seal the furnace tube at the first end and serve as a heat sink for the one or more working gases. Furthermore, the apparatus includes a fixture mechanically attached to the cover. The fixture is configured to load an array of substrates into the furnace tube as the cover seals the furnace tube. Moreover, the apparatus includes a crescent shaped baffle member disposed seamlessly at a lower portion of the inner wall for blocking a convection current of the one or more working gases cooled by the cover.
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Citations
16 Claims
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1. An apparatus for reactive thermal treatment of thin film photovoltaic devices, the apparatus comprising:
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a furnace tube including an inner wall extended from a first end to a second end; a gas supply device coupled to the second end and configured to fill one or more working gases into the furnace tube; a cover configured to seal the furnace tube at the first end and serve as a heat sink for the one or more working gases; a fixture mechanically attached to the cover, the fixture being configured to load an array of substrates into the furnace tube as the cover seals the furnace tube; and a shaped baffle member disposed seamlessly at a lower portion of the inner wall for blocking a convection current of the one or more working gases cooled by the cover. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. An apparatus for uniform thermal treatment of thin film devices, the apparatus comprising:
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a furnace tube including a circular inner wall extended along an axial direction in horizontal direction from a first end region to a second end region; a gas supply device coupled to the second end region for filling a work gas into the furnace tube; a cover member configured to seal the furnace tube at the first end region; a rack fixture mechanically attached to the cover member, the fixture being configured to load a plurality of substrates into the furnace tube as the cover member seals the furnace tube; a heater surrounded the furnace tube to provide thermal radiation from outside to heat the work gas; and a baffle member disposed at a lower portion of the circular inner wall. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15, 16)
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Specification