Method for manufacturing polishing pad
First Claim
1. A method for manufacturing a polishing pad, comprising the steps of:
- preparing a cell-dispersed urethane composition by a mechanical foaming method;
continuously or intermittently discharging a light transmitting region-forming material onto a prescribed site of a face material, while feeding the face material;
continuously discharging said cell-dispersed urethane composition onto a part of said face material where the light transmitting region-forming material is not provided;
laminating another face material on said discharged light transmitting region-forming material and cell-dispersed urethane composition;
curing the light transmitting region-forming material and the cell-dispersed urethane composition, while controlling their thickness to be uniform, so that a long polishing layer comprising a light transmitting region and a polishing region integrated therewith is formed; and
cutting the long polishing layer.
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Accused Products
Abstract
A method for manufacturing a polishing pad, which may be laminated, with a small number of manufacturing steps, high productivity and no peeling between a polishing layer and a cushion layer includes preparing a cell-dispersed urethane composition by a mechanical foaming method; continuously discharging the cell-dispersed urethane composition onto a face material, while feeding the face material; laminating another face material on the cell-dispersed urethane composition; curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a polishing layer including a polyurethane foam is formed; cutting the polishing layer parallel to the face into two pieces so that two long polishing layers each including the polishing layer and the face material are simultaneously formed; and cutting the long polishing layers to produce the polishing pad.
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Citations
10 Claims
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1. A method for manufacturing a polishing pad, comprising the steps of:
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preparing a cell-dispersed urethane composition by a mechanical foaming method; continuously or intermittently discharging a light transmitting region-forming material onto a prescribed site of a face material, while feeding the face material; continuously discharging said cell-dispersed urethane composition onto a part of said face material where the light transmitting region-forming material is not provided; laminating another face material on said discharged light transmitting region-forming material and cell-dispersed urethane composition; curing the light transmitting region-forming material and the cell-dispersed urethane composition, while controlling their thickness to be uniform, so that a long polishing layer comprising a light transmitting region and a polishing region integrated therewith is formed; and cutting the long polishing layer. - View Dependent Claims (2, 3, 4, 5)
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6. A method for manufacturing a laminated polishing pad, comprising the steps of:
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preparing a cell-dispersed urethane composition by a mechanical foaming method; discharging a light transmitting region-forming material such that the material is deposited in and on through holes, while feeding a cushion layer having continuously or intermittently provided through holes; continuously discharging said cell-dispersed urethane composition onto a part of said cushion layer where the light transmitting region-forming material is not provided; laminating a face material on the discharged light transmitting region-forming material and cell-dispersed urethane composition; curing the light transmitting region-forming material and the cell-dispersed urethane composition, while controlling their thickness to be uniform, so that a long laminated sheet comprising a light transmitting region and a polishing region integrated therewith is formed; and cutting the long laminated sheet. - View Dependent Claims (7, 8, 9, 10)
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Specification