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Method for manufacturing polishing pad

  • US 8,398,794 B2
  • Filed: 11/11/2011
  • Issued: 03/19/2013
  • Est. Priority Date: 04/19/2006
  • Status: Expired due to Fees
First Claim
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1. A method for manufacturing a polishing pad, comprising the steps of:

  • preparing a cell-dispersed urethane composition by a mechanical foaming method;

    continuously or intermittently discharging a light transmitting region-forming material onto a prescribed site of a face material, while feeding the face material;

    continuously discharging said cell-dispersed urethane composition onto a part of said face material where the light transmitting region-forming material is not provided;

    laminating another face material on said discharged light transmitting region-forming material and cell-dispersed urethane composition;

    curing the light transmitting region-forming material and the cell-dispersed urethane composition, while controlling their thickness to be uniform, so that a long polishing layer comprising a light transmitting region and a polishing region integrated therewith is formed; and

    cutting the long polishing layer.

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