Layout for multiple-fin SRAM cell
First Claim
1. A static random access memory (SRAM) cell comprising:
- a plurality of fin active regions formed on a semiconductor substrate, wherein the plurality of fin active regions include first and second adjacent fin active regions having a first spacing and a third fin active region having a second spacing from adjacent fin active regions, the second spacing being greater than the first spacing;
a plurality of fin field-effect transistors (FinFETs) formed on the plurality of fin active regions, wherein the plurality of FinFETs are configured to form first and second inverters cross-coupled for data storage and at least one port for data access;
a first contact disposed between the first and second fin active regions, electrically contacting the two fin active regions; and
a second contact disposed on and electrically contacting the third fin active region.
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Abstract
The present disclosure provides a static random access memory (SRAM) cell. The SRAM cell includes a plurality of fin active regions formed on a semiconductor substrate, wherein the plurality of fin active regions include a pair adjacent fin active regions having a first spacing and a fin active region having a second spacing from adjacent fin active regions, the second spacing being greater than the first spacing; a plurality of fin field-effect transistors (FinFETs) formed on the plurality of fin active regions, wherein the plurality of FinFETs are configured to a first and second inverters cross-coupled for data storage and at least one port for data access; a first contact disposed between the first and second the fin active regions, electrically contacting both of the first and second the fin active regions; and a second contact disposed on and electrically contacting the third fin active region.
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Citations
17 Claims
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1. A static random access memory (SRAM) cell comprising:
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a plurality of fin active regions formed on a semiconductor substrate, wherein the plurality of fin active regions include first and second adjacent fin active regions having a first spacing and a third fin active region having a second spacing from adjacent fin active regions, the second spacing being greater than the first spacing; a plurality of fin field-effect transistors (FinFETs) formed on the plurality of fin active regions, wherein the plurality of FinFETs are configured to form first and second inverters cross-coupled for data storage and at least one port for data access; a first contact disposed between the first and second fin active regions, electrically contacting the two fin active regions; and a second contact disposed on and electrically contacting the third fin active region. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A semiconductor structure comprising:
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first and second fin active regions extended from a semiconductor substrate and spaced away from each other with a first distance; third and fourth fin active regions extended from the semiconductor substrate and spaced away from each other with a second distance greater than the first distance; first and second epitaxy features formed on the first and second fin active regions, respectively, wherein the first and second epitaxy features are laterally merged together; third and fourth epitaxy features formed on the third and fourth fin active regions, respectively, wherein the third and fourth epitaxy features are separated from each other; a first contact disposed on the first and second epitaxy features merged together; and a second contact disposed on the third epitaxy feature, wherein the second contact is spaced away from the fourth epitaxy feature and is not electrically connected to the fourth fin active region. - View Dependent Claims (13, 14, 15, 16, 17)
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Specification