Dual-depth self-aligned isolation structure for a back gate electrode

• US 8,399,957 B2
• Filed: 04/08/2011
• Issued: 03/19/2013
• Est. Priority Date: 04/08/2011
• Status: Expired due to Fees

• Current Assignee: International Business Machines Corporation
• Original Assignee: International Business Machines Corporation
• Inventors: Cheng, Kangguo, Haran, Balasubramanian S., Khakifirooz, Ali, Shahidi, Ghavam G.
• Primary Examiner(s): HA, NATHAN W
• Application Number:
  US13/082,491
• Publication Number:
  US 20120256260A1
• Time in Patent Office: 711 Days
• Field of Search: 257/347, 257510-515, 257/E21.421
• US Class Current: 257/510
• CPC Class Codes: H01L 21/26506 in group IV semiconductors
• CPC Class Codes: H01L 21/2652 Through-implantation
• CPC Class Codes: H01L 21/2658 of a molecular ion, e.g. decaborane
• CPC Class Codes: H01L 21/26586 characterised by the angle between the ion beam and the crystal planes or the main crystal surface
• CPC Class Codes: H01L 21/743 Making of internal connections, substrate contacts
• CPC Class Codes: H01L 21/76229 Concurrent filling of a plurality of trenches having a different trench shape or dimension, e.g. rectangular and V-shaped trenches, wide and narrow trenches, shallow and deep trenches
• CPC Class Codes: H01L 21/84 the substrate being other than a semiconductor body, e.g. being an insulating body
• CPC Class Codes: H01L 27/1203 the substrate comprising an insulating body on a semiconductor body, e.g. SOI three-dimensional layout H01L27/0688
• CPC Class Codes: H01L 29/66742 Thin film unipolar transistors
• CPC Class Codes: H01L 29/78648 arranged on opposing sides of the channel

Abstract

Doped semiconductor back gate regions self-aligned to active regions are formed by first patterning a top semiconductor layer and a buried insulator layer to form stacks of a buried insulator portion and a semiconductor portion. Oxygen is implanted into an underlying semiconductor layer at an angle so that oxygen-implanted regions are formed in areas that are not shaded by the stack or masking structures thereupon. The oxygen implanted portions are converted into deep trench isolation structures that are self-aligned to sidewalls of the active regions, which are the semiconductor portions in the stacks. Dopant ions are implanted into the portions of the underlying semiconductor layer between the deep trench isolation structures to form doped semiconductor back gate regions. A shallow trench isolation structure is formed on the deep trench isolation structures and between the stacks.

Claims

1. A semiconductor structure comprising:

at least one stack of a buried insulator portion and a semiconductor portion located in a substrate;

a shallow trench isolation structure laterally surrounding each of said at least one stack;

a doped semiconductor back gate region located underneath said at least one stack; and

a deep trench isolation structure laterally contacting a sidewall of said doped semiconductor back gate region, wherein at least one pair of parallel sidewalls of said at least one stack is vertically coincident with a pair of parallel sidewalls of said doped semiconductor back gate region.

2. The semiconductor structure of claim 1, wherein said deep trench isolation structure comprises a silicon rich oxide having a composition of SiO_x, wherein x is in a range from 1.3 to 1.9.

3. The semiconductor structure of claim 1, wherein said shallow trench isolation structure and said deep trench isolation structure have different material compositions.

4. The semiconductor structure of claim 1, wherein all sidewalls of said at least semiconductor portion laterally contact said shallow trench isolation structure.

5. The semiconductor structure of claim 1, wherein bottom surfaces of said shallow trench isolation structure contact a top surface of said deep trench isolation structure and a top surface of said doped semiconductor back gate region.

6. The semiconductor structure of claim 1, wherein said at least one stack is a plurality of stacks, said at least one pair of parallel sidewalls of said at least one stack is a plurality of parallel sidewalls of said plurality of stacks, and each of said plurality of parallel sidewalls of said plurality of stacks is vertically coincident with said pair of parallel sidewalls of said doped semiconductor back gate region.

7. The semiconductor structure of claim 6, wherein said doped semiconductor back gate region contiguously extends underneath each of said plurality of stacks.

8. The semiconductor structure of claim 1, further comprising a back gate contact structure extending from a surface of said substrate that is coplanar with a top surface of said semiconductor portion to said doped semiconductor back gate region.

9. The semiconductor structure of claim 1, further comprising another deep trench isolation structure laterally contacting another sidewall of said doped semiconductor back gate region and laterally spaced from said deep trench isolation structure by a same width along a lengthwise direction of said deep trench isolation structure.

10. The semiconductor structure of claim 1, wherein a bottom surface of said deep trench isolation structure extends from a top surface of said substrate to a depth greater than a depth of a bottom surface of said doped semiconductor back gate region.

11. The semiconductor structure of claim 1, further comprising a contiguous buried insulator layer located within said substrate and underneath said doped semiconductor back gate region and said deep trench isolation structure and contacting a bottom surface of said deep trench isolation structure.