Pattern formation method and pattern formation apparatus, exposure method and exposure apparatus, and device manufacturing method
First Claim
1. A pattern formation method of forming a pattern on an object in a predetermined pattern formation zone, the method comprising:
- a mark detection process of, in a mark detection zone that is spaced apart from the pattern formation zone in at least a predetermined direction within a two-dimensional plane, moving a detection area of a mark detection system in at least the predetermined direction and detecting a mark placed on the object, the mark detection system performing mark detection of the mark on the object; and
a pattern formation process of moving the object in the pattern formation zone based on a mark detection result in the mark detection process and forming a pattern on the object, whereinin the mark detection process, the detection area of the mark detection system is moved in the predetermined direction.
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Accused Products
Abstract
In a measurement zone that is spaced apart in a Y-axis direction from an exposure zone that is located immediately below a projection unit, a detection area of an alignment system is moved in the Y-axis direction and a plurality of marks are sequentially detected, and therefore a movement distance of wafer stages in the Y-axis direction when performing the mark detection can be decreased compared with the case where only the wafer stages are moved while fixing the alignment system and mark detection is performed as in the conventional cases. Accordingly, a width of the measurement zone in the Y-axis direction can be reduced, which allows the apparatus to be downsized.
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Citations
41 Claims
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1. A pattern formation method of forming a pattern on an object in a predetermined pattern formation zone, the method comprising:
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a mark detection process of, in a mark detection zone that is spaced apart from the pattern formation zone in at least a predetermined direction within a two-dimensional plane, moving a detection area of a mark detection system in at least the predetermined direction and detecting a mark placed on the object, the mark detection system performing mark detection of the mark on the object; and a pattern formation process of moving the object in the pattern formation zone based on a mark detection result in the mark detection process and forming a pattern on the object, wherein in the mark detection process, the detection area of the mark detection system is moved in the predetermined direction. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. An exposure method of exposing an object, the method comprising:
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detecting a mark on the object by a mark detection system, in a measurement zone whose position in at least a first direction is different from an exposure zone where exposure of the object is performed; moving a detection area of the mark detection system in the first direction; detecting another mark whose position is different from the detected mark in the first direction on the object by the mark detection system of which the detection area has been moved; and moving the object in the exposure zone using a detection result of the marks, wherein a plurality of marks that include marks whose positions are different in the first direction on the object are detected by the mark detection system. - View Dependent Claims (11, 12, 13, 14, 15)
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16. An exposure method of exposing an object, the method comprising:
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detecting a plurality of marks on the object by a mark detection system that has a plurality of detection areas whose positions are different in a first direction, in a measurement zone whose position in at least the first direction is different from an exposure zone where exposure of the object is performed; and moving the object in the exposure zone using a detection result of the marks, wherein the plurality of marks include marks whose positions are different in a second direction orthogonal to the first direction on the object, and the object is moved in the second direction in order to detect the marks whose positions are different in the second direction in the measurement zone. - View Dependent Claims (17, 18, 19, 20, 21, 22)
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23. A pattern formation apparatus that forms a pattern on an object in a predetermined pattern formation zone, the apparatus comprising:
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a movable body that moves holding the object; a mark detection system that detects a plurality of marks on the object in a mark detection zone that is spaced apart from the pattern formation zone in at least a predetermined direction within a two-dimensional plane; and a controller that moves a detection area of the mark detection system in at least the predetermined direction and sequentially detects the plurality of marks, and moves the movable body in the pattern formation zone based on a result of the detection and forms a pattern on the object, wherein the mark detection by the mark detection system is performed before the movement of the detection area and after the movement of the detection area. - View Dependent Claims (24, 25, 26, 27, 28, 29, 30)
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31. An exposure apparatus that exposes an object, the apparatus comprising:
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a movable body that moves holding the object; a mark detection system that detects a plurality of marks on the object in a measurement zone whose position in at least a first direction is different from an exposure zone where exposure of the object is performed; and a controller that moves a detection area of the mark detection system in the first direction and detects the plurality of marks on the object using the mark detection system, and also controls movement of the movable body holding the object in the exposure zone using a detection result of the marks by the mark detection system, wherein the mark detection by the mark detection system is performed before the movement of the detection area and after the movement of the detection area. - View Dependent Claims (32, 33, 34, 35)
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36. An exposure apparatus that exposes an object, the apparatus comprising:
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a movable body that moves holding the object; a mark detection system that has a plurality of detection areas whose positions are different in a first direction and detects a plurality of marks on the object in a measurement zone whose position in at least the first direction is different from an exposure zone where exposure of the object is performed; and a controller that controls movement of the movable body holding the object in the exposure zone using a detection result of the marks, wherein the plurality of marks include marks whose positions are different in a second direction orthogonal to the first direction on the object, and the controller moves the movable body holding the object in the second direction in order to detect the marks whose positions are different in the second direction using the mark detection system in the measurement zone. - View Dependent Claims (37, 38, 39, 40, 41)
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Specification