Performance enhancement in PFET transistors comprising high-k metal gate stack by increasing dopant confinement
First Claim
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1. A method, comprising:
- introducing a well dopant species into said semiconductor region on the basis of an implantation mask;
introducing a diffusion blocking species into a semiconductor region of a P-channel transistor, wherein said diffusion blocking species is introduced by using said implantation mask;
forming a threshold adjusting semiconductor material on said semiconductor region, said semiconductor region comprising said diffusion blocking species;
forming a gate electrode structure on said threshold adjusting semiconductor material, said gate electrode structure comprising a gate dielectric material separating an electrode material of said gate electrode structure from a channel region in said threshold adjusting semiconductor material;
introducing dopants for drain and source extension regions and drain and source regions; and
annealing said P-channel transistor by using said diffusion blocking species to suppress dopant diffusion below said channel region.
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Abstract
In a P-channel transistor comprising a high-k metal gate electrode structure, a superior dopant profile may be obtained, at least in the threshold adjusting semiconductor material, such as a silicon/germanium material, by incorporating a diffusion blocking species, such as fluorine, prior to forming the threshold adjusting semiconductor material. Consequently, the drain and source extension regions may be provided with a high dopant concentration as required for obtaining the target Miller capacitance without inducing undue dopant diffusion below the threshold adjusting semiconductor material, which may otherwise result in increased leakage currents and increased risk of punch through events.
14 Citations
16 Claims
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1. A method, comprising:
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introducing a well dopant species into said semiconductor region on the basis of an implantation mask; introducing a diffusion blocking species into a semiconductor region of a P-channel transistor, wherein said diffusion blocking species is introduced by using said implantation mask; forming a threshold adjusting semiconductor material on said semiconductor region, said semiconductor region comprising said diffusion blocking species; forming a gate electrode structure on said threshold adjusting semiconductor material, said gate electrode structure comprising a gate dielectric material separating an electrode material of said gate electrode structure from a channel region in said threshold adjusting semiconductor material; introducing dopants for drain and source extension regions and drain and source regions; and annealing said P-channel transistor by using said diffusion blocking species to suppress dopant diffusion below said channel region. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method of forming a P-channel transistor, the method comprising:
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performing a first implantation process so as to incorporate a well dopant species into an active region of said P-channel transistor by using an implantation mask; performing a second implantation process so as to incorporate a non-doping species into said active region; performing an anneal process so as to activate said well dopant species and stabilize said non-doping species; forming a semiconductor material on said active region; forming a gate electrode structure on said semiconductor material; and forming drain and source extension regions and drain and source regions in said active region adjacent to said gate electrode structure. - View Dependent Claims (11, 12, 13, 14, 15)
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16. A method, comprising:
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introducing a diffusion blocking species into a semiconductor region of a P-channel transistor; stabilizing said diffusion blocking species by annealing said semiconductor region; after stabilizing said diffusion blocking species, forming a threshold adjusting semiconductor material on said semiconductor region, said semiconductor region comprising said diffusion blocking species; forming a gate electrode structure on said threshold adjusting semiconductor material, said gate electrode structure comprising a gate dielectric material separating an electrode material of said gate electrode structure from a channel region in said threshold adjusting semiconductor material; introducing dopants for drain and source extension regions and drain and source regions; and annealing said P-channel transistor by using said diffusion blocking species to suppress dopant diffusion below said channel region.
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Specification