Trench schottky diode and method for manufacturing the same
First Claim
1. A trench Schottky diode comprising:
- a semiconductor substrate having a first plurality of trenches and a second plurality of trenches;
a first plurality of gate oxide layers correspondingly formed on surfaces of the first plurality of trenches and protruding above a first surface of the semiconductor substrate;
a second plurality of gate oxide layers correspondingly formed on surfaces of the second plurality of trenches and protruding above a first surface of the semiconductor substrate;
a first plurality of polysilicon structures correspondingly filled in the first plurality of trenches and protruding above the first surface of the semiconductor substrate;
a second plurality of polysilicon structures correspondingly filled in the second plurality of trenches and protruding above the first surface of the semiconductor substrate;
a first masking layer on a portion of the first surface among the first plurality of trenches and covering the first surface among the first plurality of trenches and the first plurality of gate oxide layer;
a second masking layer on said first masking layer and said first plurality of polysililcon structure, and completely covering the first masking layer; and
an electrode formed on the guard ring, the other portion of the first surface, the second number of the protruding polysilicon structures and the second number of the protruding gate oxide layers.
2 Assignments
0 Petitions
Accused Products
Abstract
A trench Schottky diode and its manufacturing method are provided. The trench Schottky diode includes a semiconductor substrate having therein a plurality of trenches, a gate oxide layer, a polysilicon structure, a guard ring and an electrode. At first, the trenches are formed in the semiconductor substrate by an etching step. Then, the gate oxide layer and the polysilicon structure are formed in the trenches and protrude above a surface of the semiconductor substrate. The guard ring is formed to cover a portion of the resultant structure. At last, the electrode is formed above the guard ring and the other portion not covered by the guard ring. The protruding gate oxide layer and the protruding polysilicon structure can avoid cracks occurring in the trench structure.
20 Citations
8 Claims
-
1. A trench Schottky diode comprising:
-
a semiconductor substrate having a first plurality of trenches and a second plurality of trenches; a first plurality of gate oxide layers correspondingly formed on surfaces of the first plurality of trenches and protruding above a first surface of the semiconductor substrate; a second plurality of gate oxide layers correspondingly formed on surfaces of the second plurality of trenches and protruding above a first surface of the semiconductor substrate; a first plurality of polysilicon structures correspondingly filled in the first plurality of trenches and protruding above the first surface of the semiconductor substrate; a second plurality of polysilicon structures correspondingly filled in the second plurality of trenches and protruding above the first surface of the semiconductor substrate; a first masking layer on a portion of the first surface among the first plurality of trenches and covering the first surface among the first plurality of trenches and the first plurality of gate oxide layer; a second masking layer on said first masking layer and said first plurality of polysililcon structure, and completely covering the first masking layer; and an electrode formed on the guard ring, the other portion of the first surface, the second number of the protruding polysilicon structures and the second number of the protruding gate oxide layers. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
-
Specification