Patterned inorganic layers, radiation based patterning compositions and corresponding methods
First Claim
1. A patterned structure comprising a substrate and a patterned inorganic material on a surface of the substrate, wherein the patterned inorganic material has edges with an average line-width roughness no more than about 2.25 nm for features with an average pitch of no more than about 60 nm or with an average line-width roughness from about 1.2 nm to about 1.6 nm for individual features having an average width of no more than about 30 nm.
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Abstract
Stabilized precursor solutions can be used to form radiation inorganic coating materials. The precursor solutions generally comprise metal suboxide cations, peroxide-based ligands and polyatomic anions. Design of the precursor solutions can be performed to achieve a high level of stability of the precursor solutions. The resulting coating materials can be designed for patterning with a selected radiation, such as ultraviolet light, x-ray radiation or electron beam radiation. The radiation patterned coating material can have a high contrast with respect to material properties, such that development of a latent image can be successful to form lines with very low line-width roughness and adjacent structures with a very small pitch.
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17 Claims
- 1. A patterned structure comprising a substrate and a patterned inorganic material on a surface of the substrate, wherein the patterned inorganic material has edges with an average line-width roughness no more than about 2.25 nm for features with an average pitch of no more than about 60 nm or with an average line-width roughness from about 1.2 nm to about 1.6 nm for individual features having an average width of no more than about 30 nm.
Specification