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Semiconductor device

  • US 8,415,667 B2
  • Filed: 12/01/2010
  • Issued: 04/09/2013
  • Est. Priority Date: 12/04/2009
  • Status: Active Grant
First Claim
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1. A semiconductor device comprising a transistor, the transistor comprising:

  • an oxide semiconductor layer;

    a gate electrode layer adjacent to the oxide semiconductor layer;

    a gate insulating layer interposed between the oxide semiconductor layer and the gate electrode layer; and

    a source electrode layer in contact with the oxide semiconductor layer and a drain electrode layer in contact with the oxide semiconductor layer,wherein a work function (φ

    m) of a conductor used for the source electrode layer and the drain electrode layer satisfies φ

    m>

    χ

    +Eg/2,wherein a barrier for holes (φ

    Bp) represented by (χ

    +Eg

    φ

    m) is less than 0.25 eV, andwherein an electron affinity of an oxide semiconductor used for the oxide semiconductor layer is represented by χ

    (eV) and a band gap of the oxide semiconductor used for the oxide semiconductor layer is represented by Eg (eV).

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