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Lithographic apparatus and device manufacturing method

  • US 8,416,385 B2
  • Filed: 08/31/2010
  • Issued: 04/09/2013
  • Est. Priority Date: 05/30/2003
  • Status: Expired due to Fees
First Claim
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1. A lithographic projection apparatus comprising:

  • a substrate table configured to hold a substrate;

    a projection system arranged to project a patterned beam of radiation onto a radiation sensitive target portion of the substrate; and

    a liquid supply system configured to provide a liquid to a space between the substrate table and the projection system, the liquid having a pH of less than 7, the liquid supply system comprising a structure located between the substrate table and an optical element of the projection system nearest the substrate table and in contact, in use, with the liquid, the structure comprising;

    an inlet to supply the liquid to between the structure and the projection system, andan outlet to remove the liquid from between the structure and the substrate table.

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