Lithographic apparatus and device manufacturing method

• US 8,416,385 B2
• Filed: 08/31/2010
• Issued: 04/09/2013
• Est. Priority Date: 05/30/2003
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Streefkerk, Bob, Dierichs, Marcel Mathijs Theodore Marie, Gehoel-Van Ansem, Wendy Fransisca Johanna
• Primary Examiner(s): Kim, Peter B
• Application Number:
  US12/872,683
• Publication Number:
  US 20100321652A1
• Time in Patent Office: 952 Days
• Field of Search: 355/30, 355/53, 355/55, 355/72, 355/77, 359/380, 359/886, 205/91, 205/340
• US Class Current: 355/30
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70866 of mask or workpiece
• CPC Class Codes: G03F 7/70958 Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties

Abstract

A lithographic apparatus and device manufacturing method is provided in which exposure is carried out by projecting through a liquid having a pH of less than 7, the liquid being in contact with a substrate to be exposed. The liquid advantageously comprises an anti-reflective topcoat.

Claims

1. A lithographic projection apparatus comprising:

a substrate table configured to hold a substrate;

a projection system arranged to project a patterned beam of radiation onto a radiation sensitive target portion of the substrate; and

a liquid supply system configured to provide a liquid to a space between the substrate table and the projection system, the liquid having a pH of less than 7, the liquid supply system comprising a structure located between the substrate table and an optical element of the projection system nearest the substrate table and in contact, in use, with the liquid, the structure comprising;

an inlet to supply the liquid to between the structure and the projection system, and

an outlet to remove the liquid from between the structure and the substrate table.

2. The apparatus of claim 1, wherein the pH of the liquid is less than or equal to 6.5.

3. The apparatus of claim 1, wherein the pH of the liquid is greater than or equal to 4 but less than 7.

4. The apparatus of claim 1, wherein the liquid is an aqueous solution.

5. The apparatus of claim 1, wherein the structure extends along at least a part of the boundary of the space between the projection system and the outlet.

6. The apparatus of claim 5, wherein the space between the projection system and the outlet has a cross-sectional area smaller than the area of the substrate.

7. The apparatus of claim 1, comprising a further inlet located radially outward, with respect to an optical axis of the projection system, of the outlet to supply gas.

8. The apparatus of claim 1, wherein the liquid has the pH of less than 7 in the lithographic projection apparatus prior to exit from the outlet into the space to contact with the projection system and/or the substrate in the space.

9. The apparatus of claim 1, wherein the liquid supply system comprises a liquid source comprising the liquid.

10. A device manufacturing method comprising:

supplying a liquid onto a radiation-sensitive resist on a substrate, the liquid having a pH of less than 7 and comprising water and a carbon containing compound; and

projecting a patterned beam of radiation, through the liquid, onto a target portion of the radiation-sensitive resist on the substrate.

11. The method of claim 10, wherein the pH of the liquid is selected from the range of 4 to 6.5.

12. The method of claim 10, wherein the radiation-sensitive resist comprises a chemically amplified photoresist.

13. The method of claim 10, wherein the liquid has a pH of less than or equal to 6.5.

14. The method of claim 10, wherein the carbon containing compound comprises one or more fluoroalkylsulfonic acids, a salt thereof, or both.

15. A lithographic projection apparatus comprising:

a substrate table configured to hold a substrate;

a projection system arranged to project a patterned beam of radiation onto a radiation sensitive target portion of the substrate; and

a liquid supply system configured to provide a liquid to a space between the projection system and the substrate, the liquid having a pH of less than 7 and the liquid comprising water and a carbon containing compound; and

a source having, in use, the carbon containing compound.

16. The apparatus of claim 15, wherein the pH of the liquid is less than or equal to 6.5.

17. The apparatus of claim 15, wherein the liquid supply system comprises a member having an inlet to supply the liquid to the space between the projection system and the substrate and an outlet to remove the liquid from the space between the projection system and the substrate, the member extending along at least a part of the boundary of the space between the projection system and the outlet.

18. The apparatus of claim 17, wherein the space between the projection system and the outlet has a cross-sectional area smaller than the area of the substrate.

19. The apparatus of claim 17, comprising a further inlet located radially outward, with respect to an optical axis of the projection system, of the outlet to supply gas.

20. The apparatus of claim 17, wherein the outlet is located between the inlet and the substrate.