Memory device
First Claim
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1. A memory device comprising:
- a NAND cell unit including a plurality of memory cells connected in series;
a first selection transistor connected to a first terminal of the NAND cell unit;
a second selection transistor connected to a second terminal of the NAND cell unit;
a source line connected to the first selection transistor; and
a bit line connected to the second selection transistor,wherein each of the first selection transistor and the second selection transistor comprises an oxide semiconductor layer including a channel region,wherein the first selection transistor overlaps with the NAND cell unit with an insulating layer interposed between the first selection transistor and the NAND cell unit, andwherein the second selection transistor overlaps with the NAND cell unit with the insulating layer interposed between the second selection transistor and the NAND cell unit.
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Abstract
A memory device in which a write error can be prevented is provided. The memory device includes a NAND cell unit including a plurality of memory cells connected in series, a first selection transistor connected to one of terminals of the NAND cell unit, a second selection transistor connected to the other of the terminals of the NAND cell unit, a source line connected to the first selection transistor, and a bit line which intersects with the source line and is connected to the second selection transistor. In the memory device, a channel region of each of the first selection transistor and the second selection transistor is formed in an oxide semiconductor layer.
119 Citations
22 Claims
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1. A memory device comprising:
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a NAND cell unit including a plurality of memory cells connected in series; a first selection transistor connected to a first terminal of the NAND cell unit; a second selection transistor connected to a second terminal of the NAND cell unit; a source line connected to the first selection transistor; and a bit line connected to the second selection transistor, wherein each of the first selection transistor and the second selection transistor comprises an oxide semiconductor layer including a channel region, wherein the first selection transistor overlaps with the NAND cell unit with an insulating layer interposed between the first selection transistor and the NAND cell unit, and wherein the second selection transistor overlaps with the NAND cell unit with the insulating layer interposed between the second selection transistor and the NAND cell unit. - View Dependent Claims (2, 3, 4)
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5. A memory device comprising:
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a NAND cell unit including a plurality of memory cells connected in series; a first selection transistor provided between a first terminal of the NAND cell unit and a source line; and a second selection transistor provided between a second terminal of the NAND cell unit and a bit line, wherein the first selection transistor is connected to the first terminal of the NAND cell unit and the source line, wherein the second selection transistor is connected to the second terminal of the NAND cell unit and the bit line, wherein each of the first selection transistor and the second selection transistor comprises an oxide semiconductor layer including a channel region, wherein the first selection transistor overlaps with the NAND cell unit with an insulating layer interposed between the first selection transistor and the NAND cell unit, and wherein the second selection transistor overlaps with the NAND cell unit with the insulating layer interposed between the second selection transistor and the NAND cell unit. - View Dependent Claims (6, 7, 8)
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9. A memory device comprising:
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a NAND cell unit including a plurality of memory cells connected in series; a first selection transistor; and a second selection transistor, wherein a first terminal of the first selection transistor is connected to a source line, wherein a second terminal of the first selection transistor is connected to a first terminal of the NAND cell unit, wherein a first terminal of the second selection transistor is connected to a bit line, wherein a second terminal of the second selection transistor is connected to a second terminal of the NAND cell unit, and wherein each of the first selection transistor and the second selection transistor comprises an oxide semiconductor layer including a channel region, wherein the first selection transistor overlaps with the NAND cell unit with an insulating layer interposed between the first selection transistor and the NAND cell unit, and wherein the second selection transistor overlaps with the NAND cell unit with the insulating layer interposed between the second selection transistor and the NAND cell unit. - View Dependent Claims (10, 11, 12)
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13. A memory device comprising:
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a first transistor; a second transistor; a third transistor comprising a first floating gate electrode; a fourth transistor comprising a second floating gate electrode; a source line electrically connected to one of a source and a drain of the first transistor; and a bit line electrically connected to one of a source and a drain of the second transistor, wherein the other of the source and the drain of the first transistor is electrically connected to the other of the source and the drain of the second transistor through the third transistor and the fourth transistor, wherein the third transistor and the fourth transistor are connected in series between the first transistor and the second transistor, wherein each of the first transistor and the second transistor comprises an oxide semiconductor layer including a channel region, and wherein the third transistor and the fourth transistor does not comprise an oxide semiconductor layer. - View Dependent Claims (14, 15, 16, 17)
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18. A memory device comprising:
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a first transistor; a second transistor; a third transistor comprising a first floating gate electrode; a fourth transistor comprising a second floating gate electrode; a source line electrically connected to one of a source and a drain of the first transistor; and a bit line electrically connected to one of a source and a drain of the second transistor, wherein the other of the source and the drain of the first transistor is electrically connected to the other of the source and the drain of the second transistor through the third transistor and the fourth transistor, wherein the third transistor and the fourth transistor are connected in series between the first transistor and the second transistor, wherein each of the first transistor and the second transistor comprises an oxide semiconductor layer including a channel region, and wherein each of the third transistor and the fourth transistor comprises a channel region formed in a semiconductor substrate. - View Dependent Claims (19, 20, 21, 22)
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Specification