Exposure method, exposure apparatus, and method for producing device

• US 8,421,992 B2
• Filed: 08/14/2008
• Issued: 04/16/2013
• Est. Priority Date: 05/28/2003
• Status: Expired due to Fees

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Hirukawa, Shigeru
• Primary Examiner(s): Ton, Toan
• Assistant Examiner(s): Sanei, Mona M
• Application Number:
  US12/222,706
• Publication Number:
  US 20080309896A1
• Time in Patent Office: 1,706 Days
• Field of Search: 355/30, 355/52, 355/53, 355/55, 355/72, 355/77, 430/30, 430/311
• US Class Current: 355/30
• CPC Class Codes: G03F 7/70258 Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70433 Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70858 Environment aspects, e.g. pressure of beam-path gas, temperature pollution aspects G03F7/70916
• CPC Class Codes: G03F 7/70875 Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
• CPC Class Codes: G03F 7/70891 Temperature

Abstract

An exposure method forms an immersion area in at least a part of a substrate including a projection area of a projection optical system and projects an image of a mask pattern onto the substrate through liquid between the projection optical system and the substrate. Distribution of the mask pattern is measured and adjustment is made so that a desired image of the pattern is projected onto the substrate according to distribution of the exposure light incident into the liquid between the projection optical system and the substrate when exposing the substrate. It is possible to expose the substrate with the pattern accurately regardless of the distribution of the mask pattern.

Claims

1. An exposure method comprising:

filling, with a liquid, a space between a projection optical system and a temperature sensor arranged on a substrate stage which is movable;

measuring a temperature of the liquid in a plurality of positions inside a projection area of the projection optical system by using the temperature sensor;

after measuring the temperature of the liquid, replacing the temperature sensor with a substrate so that the substrate is held by the substrate stage in place of the temperature sensor;

arranging the substrate at a position below the projection optical system; and

exposing the substrate through the liquid filled in a space between the projection optical system and the substrate.

2. The exposure method according to claim 1, wherein the temperature sensor is detachable with respect to the substrate stage.

3. The exposure method according to claim 1, wherein the temperature of the liquid is changed by radiation of an exposure light beam.

4. A method for producing a device, comprising using the exposure method as defined in claim 1.

5. The exposure method according to claim 1, wherein the temperature sensor has a plurality of sensor elements which are arranged two-dimensionally.

6. The exposure method according to claim 5, wherein the temperature sensor is provided on a dummy substrate having a same shape as a shape of the substrate.

7. The exposure method according to claim 6, wherein the temperature of the liquid is measured through the liquid filled in a space between the projection optical system and the dummy substrate.

8. The exposure method according to claim 1, wherein the temperature sensor has a plurality of sensor elements arranged in sensor arrangement areas which are arranged in a matrix form.

9. The exposure method according to claim 8, wherein the sensor arrangement areas have a size corresponding to a size of exposure areas of the substrate which are exposed with an exposure light beam.

10. The exposure method according to claim 1, wherein the substrate is exposed while being moved in a predetermined direction;

and

the temperature sensor has a plurality of sensor elements which are arranged in a direction intersecting the predetermined direction.

11. The exposure method according to claim 1, wherein the temperature of the liquid is measured simultaneously in the plurality of positions.

12. The exposure method according to claim 11, wherein the temperature sensor measures a two-dimensional temperature distribution of the liquid inside the projection area of the projection optical system.

13. The exposure method according to claim 1, wherein an exposure light beam is irradiated onto the substrate via a pattern formed on a mask, the projection optical system and the liquid;

and

the liquid is supplied to a space between the projection optical system and a part of the substrate.

14. An exposure apparatus comprising:

a projection optical system which projects an image of a pattern onto a substrate through a liquid; and

a liquid supply mechanism which has a plurality of supply ports and which is capable of supplying liquids having mutually different temperatures from the plurality of supply ports respectively to form a liquid immersion area between the substrate and the projection optical system,

wherein a temperature of a liquid, among the liquids, which is supplied from a first supply port among the plurality of supply ports, and a temperature of a liquid, among the liquids, which is simultaneously supplied from a second supply port different from the first supply port, are different from each other.

15. The exposure apparatus according to claim 14, wherein the substrate is exposed while being moved in a predetermined direction, and the plurality of supply ports are separated from each other in a direction intersecting the predetermined direction.

16. The exposure apparatus according to claim 15, wherein the liquid supply mechanism supplies the liquids of the mutually different temperatures to uniformize a temperature distribution of the liquid in the direction intersecting the predetermined direction.

17. The exposure apparatus according to claim 14, wherein the plurality of supply ports are separated from each other in a direction intersecting a surface of the substrate.

18. The exposure apparatus according to claim 17, wherein a liquid among the liquids, which is supplied from a supply port which is included in the plurality of supply ports, has a temperature lower than a temperature of another liquid which is supplied from another supply port, included in the plurality of supply ports and located farther from the surface of the substrate than the supply port.

19. A method for producing a device, comprising using the exposure apparatus as defined in claim 14.