Array substrate and method for manufacturing the same
First Claim
1. A method for forming an array substrate comprising:
- 1) sequentially depositing a transparent conductive metal layer and a gate metal layer on a base substrate;
2) performing a patterning process by using a first dual-tone mask plate to form a pixel electrode pattern and a gate pattern comprising a gate electrode and a gate scanning line;
3) sequentially depositing a gate insulating layer and an active layer on the base substrate with the formed pixel electrode pattern and the gate pattern;
4) performing a patterning process by using a second dual-tone mask plate to form an active pattern corresponding to the gate electrode and a via hole in the gate insulating layer for exposing the pixel electrode, and remaining photoresist the active layer pattern;
5) depositing a source/drain metal layer on the base substrate with the active pattern and the via hole, through which the source/drain metal layer is in contact with the pixel electrode;
6) lifting off the photoresist remaining on the active layer pattern to remove the photoresist and a portion of the source/drain metal layer corresponding to the photoresist; and
7) performing a patterning process by using a third mask plate to forming a source/drain pattern, wherein the source/drain pattern comprises a data scanning line crossing with the gate scanning line, a source electrode and a drain electrode, and a portion of the drain electrode is in contact with the pixel electrode through the via hole.
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Accused Products
Abstract
The present invention provides an array substrate, comprising: a base substrate; a pixel electrode pattern and a gate pattern formed on the base substrate, the gate pattern comprises a gate scanning line and a gate electrode of a transistor, both of the gate scanning line and the gate electrode comprise transparent conductive metal layer and the gate metal layer stacking on the substrate, each pixel electrode in the pixel electrode pattern comprises transparent conductive metal layer; a gate insulating layer on the pixel electrode pattern and the gate pattern, an active layer pattern on the gate insulating layer and corresponding to the gate electrode, a via hole in the gate insulating layer for exposing the pixel electrode; and a source/drain pattern on the gate insulating layer, the source/drain pattern comprises a data scanning line crossing with the gate scanning line, source and drain electrodes of the transistor, and the drain electrode is in contact with the pixel electrode through the via hole.
8 Citations
6 Claims
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1. A method for forming an array substrate comprising:
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1) sequentially depositing a transparent conductive metal layer and a gate metal layer on a base substrate; 2) performing a patterning process by using a first dual-tone mask plate to form a pixel electrode pattern and a gate pattern comprising a gate electrode and a gate scanning line; 3) sequentially depositing a gate insulating layer and an active layer on the base substrate with the formed pixel electrode pattern and the gate pattern; 4) performing a patterning process by using a second dual-tone mask plate to form an active pattern corresponding to the gate electrode and a via hole in the gate insulating layer for exposing the pixel electrode, and remaining photoresist the active layer pattern; 5) depositing a source/drain metal layer on the base substrate with the active pattern and the via hole, through which the source/drain metal layer is in contact with the pixel electrode; 6) lifting off the photoresist remaining on the active layer pattern to remove the photoresist and a portion of the source/drain metal layer corresponding to the photoresist; and 7) performing a patterning process by using a third mask plate to forming a source/drain pattern, wherein the source/drain pattern comprises a data scanning line crossing with the gate scanning line, a source electrode and a drain electrode, and a portion of the drain electrode is in contact with the pixel electrode through the via hole. - View Dependent Claims (2, 3, 4, 5, 6)
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Specification