Method of manufacturing a micro-electromechanical system (MEMS) device
First Claim
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1. A method of manufacturing a micro-electromechanical systems (MEMS) device, the method comprising:
- forming a mirror from a first substrate;
forming a hinge/support structure from a second substrate, including forming a recessed region using a recess etch and forming torsional hinge regions using a through-substrate etch; and
attaching the mirror within the recessed region to the hinge/support structure.
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Abstract
A method for manufacturing a mirror device is presented. The method includes forming a mirror from a first substrate and forming a hinge/support structure from a second substrate. The hinge/support structure is formed with a recessed region and a torsional hinge region. The mirror is attached to the hinge/support structure at the recessed region. Further, a driver system is employed to cause the mirror to pivot about the torsional hinge region.
10 Citations
25 Claims
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1. A method of manufacturing a micro-electromechanical systems (MEMS) device, the method comprising:
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forming a mirror from a first substrate;
forming a hinge/support structure from a second substrate, including forming a recessed region using a recess etch and forming torsional hinge regions using a through-substrate etch; andattaching the mirror within the recessed region to the hinge/support structure. - View Dependent Claims (2, 3, 4, 5, 6, 20, 21, 22, 23, 24, 25)
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7. A method of manufacturing a micro-electromechanical systems (MEMS) device, the method comprising:
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providing a first substrate; forming a mirror from the first substrate; providing a second substrate; patterning a front side of the second substrate; performing a through-substrate etch on the second substrate, thereby forming a hinge/support structure that includes torsional hinge regions; and coupling the mirror to the hinge/support structure, wherein the torsional hinge regions remain exposed; wherein removing the portion of the second substrate comprises etching a backside of the second substrate to remove a portion of the backside of the second substrate prior to performing the through-substrate etch on the second substrate.
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8. A method of making a MEMS device, comprising:
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forming a flat rectangular mirror of a first width and a first length from a first substrate of a first thickness; forming a hinge/support structure from a second substrate of a second thickness, including; patterning and etching the second substrate to form a recessed region of a second width greater than the first width, and a second length less than the first length;
the second substrate having a third thickness, reduced from the second thickness, at the recessed region; andpatterning and etching the second substrate in a through-substrate etch to form a torsional hinge; and mounting the mirror to the hinge/support structure, with the mirror positioned within the recessed region for rotation of the mirror length about a hinge axis defined by the torsional hinge. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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Specification