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Lithographic apparatus and monitoring method

  • US 8,432,529 B2
  • Filed: 06/24/2010
  • Issued: 04/30/2013
  • Est. Priority Date: 07/30/2009
  • Status: Active Grant
First Claim
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1. A lithographic apparatus comprising a radiation beam monitoring apparatus, the radiation beam monitoring apparatus comprising an optical element configured to generate a diffraction pattern, and an imaging detector located after the optical element and not in a focal plane of the optical element such that the imaging detector is capable of detecting a mixture of spatial coherence and divergence of a radiation beam of the lithographic apparatus.

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