Antimony-free glass, antimony-free frit and a glass package that is hermetically sealed with the frit
First Claim
1. A method of forming a glass package comprising:
- depositing a frit on a first glass substrate plate;
joining the first glass plate to a second glass substrate plate;
irradiating the frit with an irradiation source to form a hermetic seal between the first and second glass substrate plates; and
wherein the fit includes an antimony-free glass comprising;
V2O5 (40-50 mole %)P2O5 (≧
20 mole % and <
25 mole %)ZnO (0-10 mole %)Fe2O3 (>
0 mole % and <
25 mole %)TiO2 (>
0 mole % and <
25 mole %); and
wherein TiO2+Fe2O3 is in the range from 20 mole % to 35 mole %.
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Accused Products
Abstract
An antimony-free glass suitable for use in a frit for producing a hermetically sealed glass package is described. The hermetically sealed glass package, such as an OLED display device, is manufactured by providing a first glass substrate plate and a second glass substrate plate and depositing the antimony-free frit onto the first substrate plate. OLEDs may be deposited on the second glass substrate plate. An irradiation source (e.g., laser, infrared light) is then used to heat the frit which melts and forms a hermetic seal that connects the first glass substrate plate to the second glass substrate plate and also protects the OLEDs. The antimony-free glass has excellent aqueous durability, good flow, low glass transition temperature and low coefficient of thermal expansion.
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Citations
18 Claims
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1. A method of forming a glass package comprising:
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depositing a frit on a first glass substrate plate; joining the first glass plate to a second glass substrate plate; irradiating the frit with an irradiation source to form a hermetic seal between the first and second glass substrate plates; and wherein the fit includes an antimony-free glass comprising; V2O5 (40-50 mole %) P2O5 (≧
20 mole % and <
25 mole %)ZnO (0-10 mole %) Fe2O3 (>
0 mole % and <
25 mole %)TiO2 (>
0 mole % and <
25 mole %); andwherein TiO2+Fe2O3 is in the range from 20 mole % to 35 mole %. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
wherein TiO2+Fe2O3 is 35 mole %.
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3. The method according to claim 1, wherein the antimony-free glass comprises:
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V2O5 (50 mole %) P2O5 (20 mole %) ZnO (10 mole %) Fe2O3 (>
10 mole % and <
15 mole %)TiO2 (>
5 mole % and <
10 mole %); andwherein TiO2+Fe2O3 is 20 mole %.
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4. The method according to claim 1, wherein the antimony-free glass comprises:
-
V2O5 (40-50 mole %) P2O5 (≧
20 mole % and <
25 mole %)ZnO (5-10 mole %) Fe2O3 (>
0 mole % and <
25 mole %)TiO2 (>
0 mole % and <
25 mole %); andwherein TiO2+Fe2O3 is in the range from 20 mole % to 35 mole %.
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5. The method according to claim 1, wherein the antimony-free glass has a Tg≦
- 400°
C.
- 400°
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6. The method according to claim 1, wherein the antimony-free glass has a CTE in the range from 35×
- 10−
7/°
C. to 45×
107/°
C.
- 10−
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7. The method according to claim 1, wherein the frit comprises a CTE-lowering filler.
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8. The method according to claim 1, further comprising an organic material disposed between the first and second glass plates.
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9. The method according to claim 8, wherein the organic material comprises an organic light emitting diode.
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10. The method according to claim 1, further comprising presintering the frit to the first glass substrate.
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11. A method of forming an organic light emitting diode device comprising:
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depositing a fit on a first glass substrate plate; joining the first glass plate to a second glass substrate plate, there being an organic layer positioned between the first and second glass substrate plates; irradiating the fit with an irradiation source to form a hermetic seal between the first and second glass substrate plates; and wherein the frit includes an antimony-free glass comprising; V2O5 (40-50 mole %) P2O5 (≧
20 mole % and <
25 mole %)ZnO (0-10 mole %) Fe2O3 (>
0 mole % and <
25 mole %)TiO2 (>
0 mole % and <
25 mole %); andwherein TiO2+Fe2O3 is in the range from 20 mole % to 35 mole %. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18)
wherein TiO2+Fe2O3 is 35 mole %.
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13. The method according to claim 11, wherein the antimony-free glass comprises:
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V2O5 (50 mole %) P2O5 (20 mole %) ZnO (10 mole %) Fe2O3 (>
10 mole % and <
15 mole %)TiO2 (>
5 mole % and <
10 mole %); andwherein TiO2+Fe2O3 is 20 mole %.
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14. The method according to claim 11, wherein the antimony-free glass comprises:
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V2O5 (40-50 mole %) P2O5 (≧
20 mole % and <
25 mole %)ZnO (5-10 mole %) Fe2O3 (>
0 mole % and <
25 mole %)TiO2 (>
0 mole % and <
25 mole %); andwherein TiO2+Fe2O3 is in the range from 20 mole % to 35 mole %.
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15. The method according to claim 11, wherein the antimony-free glass has a Tg≦
- 400°
C.
- 400°
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16. The method according to claim 11, wherein the antimony-free glass has a CTE in the range from 35×
- 10−
7/°
C. to 45×
10−
7/°
C.
- 10−
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17. The method according to claim 11, wherein the frit comprises a CTE-lowering filler.
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18. The method according to claim 11, further comprising presintering the frit to the first glass substrate.
Specification