Patterning electrode materials free from berm structures for thin film photovoltaic cells
First Claim
1. A method comprising:
- providing a substrate having an upper surface and an opposing lower surface;
forming a first electrode layer overlying the upper surface, the first electrode layer having a first thickness;
forming one or more patterns in the first electrode layer;
filling at least one pattern, from the one or more patterns, with a conductive material to form a first interconnect structure having a first height, wherein the first height is substantially equal to the first thickness;
forming a photovoltaic layer over the first electrode; and
forming a second electrode layer having a second thickness over the photovoltaic layer.
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Accused Products
Abstract
A method for forming a thin film photovoltaic device having patterned electrode films includes providing a soda lime glass substrate with an overlying lower electrode layer comprising a molybdenum material. The method further includes subjecting the lower electrode layer with one or more pulses of electromagnetic radiation from a laser source to ablate one or more patterns associated with one or more berm structures from the lower electrode layer. Furthermore, the method includes processing the lower electrode layer comprising the one or more patterns using a mechanical brush device to remove the one or more berm structures followed by treating the lower electrode layer comprising the one or more patterns free from the one or more berm structures. The method further includes forming a layer of photovoltaic material overlying the lower electrode layer and forming a first zinc oxide layer overlying the layer of photovoltaic material.
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Citations
12 Claims
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1. A method comprising:
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providing a substrate having an upper surface and an opposing lower surface; forming a first electrode layer overlying the upper surface, the first electrode layer having a first thickness; forming one or more patterns in the first electrode layer; filling at least one pattern, from the one or more patterns, with a conductive material to form a first interconnect structure having a first height, wherein the first height is substantially equal to the first thickness; forming a photovoltaic layer over the first electrode; and forming a second electrode layer having a second thickness over the photovoltaic layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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Specification