Backside depletion for backside illuminated image sensors

• US 8,436,443 B2
• Filed: 04/22/2008
• Issued: 05/07/2013
• Est. Priority Date: 09/29/2006
• Status: Active Grant

• Current Assignee: Taiwan Semiconductor Manufacturing Company Limited
• Original Assignee: Taiwan Semiconductor Manufacturing Company Limited
• Inventors: Hsu, Tzu-Hsuan, Liu, Han-Chi, Wang, Ching-Chun
• Primary Examiner(s): Parker, Kenneth
• Assistant Examiner(s): Chen, Yu
• Application Number:
  US12/107,199
• Publication Number:
  US 20080224247A1
• Time in Patent Office: 1,841 Days
• Field of Search: 257290-294, 257/432, 257/436, 257/439, 257/440, 257443-445, 257/447, 257/458, 257460-464, 257/228, 257/233, 257/E27.133, 257/E31.053, 257/E31.121
• US Class Current: 257/447
• CPC Class Codes: H01L 27/14603 Special geometry or disposition of pixel-elements, address-lines or gate-electrodes
• CPC Class Codes: H01L 27/1464 Back illuminated imager structures
• CPC Class Codes: H01L 27/14683 Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof not peculiar thereto H01L21/00
• CPC Class Codes: H01L 31/0232 Optical elements or arrangements associated with the device H01L31/0236 takes precedence; for photovoltaic cells H01L31/054; for photovoltaic modules H02S40/20

Abstract

A backside illuminated image sensor is provided which includes a substrate having a front side and a backside, a sensor formed in the substrate at the front side, the sensor including at least a photodiode, and a depletion region formed in the substrate at the backside, a depth of the depletion region is less than 20% of a thickness of the substrate.

Claims

1. A backside illuminated image sensor, comprising:

a semiconductive substrate having a first conductivity type and a first doping concentration, the semiconductive substrate having a first surface and a second surface opposite the first surface;

a sensor formed in the semiconductive substrate at the first surface, the sensor including at least a photodiode;

a first doped region formed in the semiconductive substrate proximate to the second surface, the first doped region having the first conductivity type and a second doping concentration that is greater than the first doping concentration;

a second doped region formed in the semiconductive substrate adjacent to the first doped region such that the second doped region is positioned between the first doped region and the second surface, the second doped region having a second conductivity type that is opposite the first conductivity type, and further wherein the first doped region and the second doped region form a depletion region in the semiconductive substrate;

a metal interconnection structure formed on the first surface of the substrate;

a color filter formed on the second surface of the semiconductive substrate and aligned with the sensor; and

a microlens formed on the color filter.

2. The backside illuminated image sensor of claim 1, wherein the thickness of the substrate is about 1 μ

m to about 5 μ

m.

3. The backside illuminated image sensor of claim 1, wherein the first conductivity type is p-type and the second conductivity type is n-type.

4. The backside illuminated image sensor of claim 1, wherein the depletion region has a depth that extends into the semiconductive substrate from the second surface, the depth being less than 20% of a thickness of the semiconductive substrate.

5. The backside illuminated image sensor of claim 1, wherein the semiconductive substrate is an epitaxial layer.

6. The backside illuminated image sensor of claim 1, wherein the sensor is a type selected from the group consisting of:

an active pixel sensor and a passive pixel sensor.

7. The backside illuminated sensor of claim 1, further comprising a passivation layer formed over the metal interconnection layer.

8. A semiconductor device comprising:

a silicon substrate having a front surface and a back surface;

a plurality of sensing elements formed in the silicon substrate underneath the front surface, wherein each of the sensing elements includes at least a photodiode for sensing light radiation directed towards the back surface;

a first doped region formed in a portion of the silicon substrate at a first depth from the back surface;

a second doped region formed in a portion of the silicon substrate at a second depth from the back surface, the second depth being less than the first depth, such that the second doped region is located between the first doped region and the back surface of the silicon substrate;

a depletion region associated with the first and second doped regions, wherein the depletion region extends a third depth into the silicon substrate from the back surface, the third depth being less than 20% of a thickness of the silicon substrate; and

a metal interconnection layer and interlayer dielectric formed on the front surface of the silicon substrate.

9. The semiconductor device of claim 8, wherein the depth of the depletion region is less than about 1000 A.

10. The semiconductor device of claim 8, wherein the thickness of the semiconductor substrate is about 1 μ

m to about 5 μ

m.

11. The semiconductor device of claim 8, wherein the silicon substrate is a p-type silicon substrate, the first doped region is a p+ doped region and wherein the second doped region is an n+ doped region.

12. The semiconductor device of claim 8, further comprising:

a color filter formed on the back surface of the silicon substrate, the color filter being aligned with one of the plurality of sensing elements; and

a microlens formed on the color filter.

13. The semiconductor device of claim 8, further comprising a passivation layer formed over the metal interconnection layer.

14. A backside illuminated image sensor, comprising:

a substrate having a first surface and a second surface opposite the first surface;

a sensor formed in the substrate at the first surface, the sensor including at least a photodiode disposed at the first surface of the substrate, the photodiode for sensing light directed towards the second surface;

a first doped region disposed in the substrate proximate to the second surface, the first doped region being a first conductivity type;

a second doped region disposed in the substrate between the first doped region and the second surface, the second doped region being a second conductivity type, wherein the second conductivity type is opposite the first conductivity type, and further wherein a depletion region is formed in the substrate adjacent to the second surface, wherein the depletion region extends a depth into the substrate from the second surface, the depth being less than 20% of a thickness of the substrate;

a metal interconnection layer and interlayer dielectric formed on the first surface of the substrate;

a passivation layer formed over the metal interconnection layer;

a color filter formed on the second surface of the substrate and aligned with the sensor; and

a microlens formed on the color filter.

15. The backside illuminated image sensor of claim 14, wherein the depth into the substrate from the second surface of the substrate is less than about 1000 A.

16. The backside illuminated image sensor of claim 14, wherein the thickness of the substrate is about 1 μ

m to about 5 μ

m.

17. The backside illuminated image sensor of claim 14, wherein the substrate has the first conductivity type and a first doping concentration,

wherein the first doped region has the first conductivity type and a second doping concentration that is greater than the first doping concentration.

18. The backside illuminated image sensor of claim 14, wherein the first doped region and the second doped region form the depletion region.