Plasma supply device

• US 8,436,543 B2
• Filed: 01/11/2010
• Issued: 05/07/2013
• Est. Priority Date: 07/23/2007
• Status: Active Grant

• Current Assignee: Huettinger Elektronik GmbH + Company KG (TRUMPF SE + Co. KG)
• Original Assignee: Huettinger Elektronik GmbH + Company KG (TRUMPF SE + Co. KG)
• Inventors: Kirchmeier, Thomas, Glueck, Michael
• Primary Examiner(s): TRAN, THUY V
• Application Number:
  US12/685,142
• Publication Number:
  US 20100194280A1
• Time in Patent Office: 1,212 Days
• Field of Search: 315/224, 315/226, 315/283, 315/326, 204/230.2, 204/230.8, 204/298.08
• US Class Current: 315/224
• CPC Class Codes: G01R 21/06 by measuring current and voltage G01R21/08 - G01R21/133 take precedence
• CPC Class Codes: G01R 23/02 Arrangements for measuring frequency, e.g. pulse repetition rate; Arrangements for measuring period of current or voltage
• CPC Class Codes: H01J 37/32045 Circuits specially adapted for controlling the glow discharge
• CPC Class Codes: H02M 7/003 Constructional details, e.g. physical layout, assembly, wiring or busbar connections
• CPC Class Codes: H02M 7/5383 in a self-oscillating arrangement H02M7/538 takes precedence
• CPC Class Codes: H03H 7/40 Automatic matching of load impedance to source impedance
• CPC Class Codes: H05B 41/2806 with semiconductor devices and specially adapted for lamps without electrodes in the vessel, e.g. surface discharge lamps, electrodeless discharge lamps
• CPC Class Codes: H05H 1/46 using applied electromagnetic fields, e.g. high frequency or microwave energy H05H1/26 takes precedence
• CPC Class Codes: Y02B 20/00 Energy efficient lighting technologies, e.g. halogen lamps or gas discharge lamps

Abstract

A plasma supply device generates an output power greater than 500 W at an essentially constant basic frequency greater than 3 MHz and powers a plasma process to which is supplied the generated output power, and from which reflected power is returned to the plasma supply device. The plasma supply device includes at least one inverter connected to a DC power supply, which inverter has at least one switching element, and an output network, wherein the at least one output network includes at least one inductance that has at least one magnetic field strengthening element that is a Perminvar ferrite.

Claims

1. A plasma supply device comprising:

an inverter connected to a DC power supply, wherein the inverter has at least one switching element, and wherein the inverter is configured to convert DC power from the DC power supply into AC power greater than 500 W at an essentially constant basic frequency greater than 3 MHz; and

an output network electrically coupled to the inverter, the output network being electrically coupled to a plasma load, wherein the output network is configured to provide the AC power from the inverter to the plasma load and filter reflected power outside the basic frequency that is returned from the plasma load, the output network comprising first and second inductances electrically coupled between the inverter and a transformer, the output network further comprising a first capacitance electrically coupled to the transformer, and the output network further comprising at least one impedance adapter element configured to electrically couple the transformer to the plasma load, the impedance adapter being configured to match an output network impedance to a load impedance of the plasma load; and

wherein at least one inductance in the output network includes a magnetic field strengthening element that is a Perminvar ferrite.

2. The plasma supply device of claim 1, wherein the output network is arranged on a printed circuit board and the inductance is formed using a planar technology.

3. The plasma supply device of claim 2, wherein the printed circuit board is produced from glass fiber reinforced epoxy resin.

4. The plasma supply device of claim 2, wherein the printed circuit board defines a recess configured to receive the magnetic field strengthening element.

5. The plasma supply device of claim 2, further comprising a cooling plate connected to the printed circuit board.

6. The plasma supply device of claim 5, wherein the magnetic field strengthening element encloses the inductance and/or a winding of an output transformer, and wherein the printed circuit board is separated from the cooling plate by a distance that is greater than or equal to a thickness of the magnetic field strengthening element.

7. The plasma supply device of claim 5, further comprising a heat transmission element disposed between the printed circuit board and the cooling plate.

8. The plasma supply device of claim 7, wherein the heat transmission element is in the vicinity of an output transformer, and wherein a conductor path of the printed circuit board extends to the heat transmission element through a magnetic field strengthening element associated with the output transformer.

9. The plasma supply device of claim 1, wherein the inductance is part of an output transformer having a primary-side winding and a secondary-side winding.

10. The plasma supply device of claim 9, wherein the magnetic field strengthening element is associated with one or more windings of the output transformer.

11. The plasma supply device of claim 1, wherein the inductance has a value greater than 50 nH and a quality factor better than 200.

12. The plasma supply device of claim 1, wherein the output network is a first output network, the device further comprising a second output network having a power output coupled to a power output of the first output network by a coupler so as to provide a combined power output.

13. The plasma supply device of claim 12, wherein the coupler is disposed on a printed circuit board and is designed at least partially in a planar technology.

14. The plasma supply device of claim 12, wherein the coupler includes an inductance having a magnetic field strengthening element that is a Perminvar ferrite.

15. The plasma supply device of claim 14, wherein the magnetic field strengthening element of the coupler has the same shape as the magnetic field strengthening element of the inductance of the first output network.

16. The plasma supply device of claim 14, wherein the at least one magnetic field strengthening element of the coupler is made of the same material as the magnetic field strengthening element of the inductance of the first output network.

17. The plasma supply device of claim 1, configured to operate at an essentially constant basic frequency of less than 30 MHz.

18. The plasma supply device of claim 1, wherein the first and second inductances are electrically coupled between the inverter and a primary-side winding of the transformer.

19. The plasma supply device of claim 18, wherein the output network further comprises a third inductance that is electrically coupled between the inverter and the primary-side winding of the transformer.

20. The plasma supply device of claim 19, wherein the first capacitance is electrically coupled between the primary-side winding and a second-side winding of the transformer.

21. The plasma supply device of claim 20, wherein the impedance adapter element is configured to electrically coupled the secondary-side winding to the plasma load.

22. A method of providing power to a plasma load from a plasma supply device, the method comprising:

driving an inverter connected to a DC power supply, by driving at least one switching element so that the inverter converts DC power from the DC power supply into AC power greater than 500 W at an essentially constant basic frequency greater than 3 MHz, and

directing the AC power from the inverter to an output network, the output network being electrically coupled to the plasma load, wherein the output network is configured to provide the AC power from the inverter to the plasma load and filter reflected power outside the basic frequency that is returned from the plasma load, the output network comprising first and second inductances electrically coupled between the inverter and a transformer, the output network further comprising a first capacitance electrically coupled to the transformer, and the output network further comprising at least one impedance adapter element configured to electrically couple the transformer to the plasma load, the impedance adapter being configured to match an output network impedance to a load impedance of the plasma load,

wherein the output network includes at least one inductance that has a magnetic field strengthening element that is a Perminvar ferrite, and

wherein current through the inductance is limited so that magnetic field strength in the Perminvar ferrite is less than 50 percent of the coercive field strength of the Perminvar ferrite.

23. The method of claim 22, comprising operating the plasma supply device at an essentially constant basic frequency of less than 30 MHz.