Wafer stage
First Claim
Patent Images
1. A wafer stage, comprising:
- a platform for supporting a wafer such that a backside of the wafer is suspended above a cavity of the platform;
a support structure disposed substantially within the cavity, wherein an opening is formed in the support structure;
a support element disposed around the opening formed in the support structure, a top surface of the support element for supporting a portion of the wafer, wherein the top surface of the support element has one or more cavities; and
a vacuum suction means incorporated in the support element, the vacuum suction means enabling at least partial air evacuation of the one or more cavities of the support substrate that are in contact with the portion of the wafer,wherein the wafer stage is adapted for relative movement of the platform with respect to the support structure for alignment of the wafer with respect to a probe.
2 Assignments
0 Petitions
Accused Products
Abstract
A wafer stage and a method of supporting a wafer for inspection. the wafer stage comprises a platform for supporting a wafer such that a backside of the wafer is suspended above a cavity of the platform; and a support structure disposed substantially within the cavity for supporting a portion of the wafer; wherein the wafer stage is adapted for relative movement of the platform with respect to the support structure for alignment of the wafer with respect to a probe.
9 Citations
16 Claims
-
1. A wafer stage, comprising:
-
a platform for supporting a wafer such that a backside of the wafer is suspended above a cavity of the platform; a support structure disposed substantially within the cavity, wherein an opening is formed in the support structure; a support element disposed around the opening formed in the support structure, a top surface of the support element for supporting a portion of the wafer, wherein the top surface of the support element has one or more cavities; and a vacuum suction means incorporated in the support element, the vacuum suction means enabling at least partial air evacuation of the one or more cavities of the support substrate that are in contact with the portion of the wafer, wherein the wafer stage is adapted for relative movement of the platform with respect to the support structure for alignment of the wafer with respect to a probe. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
-
-
13. A method of supporting a wafer for inspection, the method comprising the steps of:
-
supporting the wafer such that a backside of the wafer is suspended above a cavity of a platform; providing a support structure disposed substantially within the cavity, wherein an opening is formed in the support structure; providing a support element disposed around the opening formed in the support structure, a top surface of the support element for supporting a portion of the wafer; providing one or more cavities in the top surface of the support element; providing a vacuum suction means incorporated in the support element, the vacuum suction means enabling at least partial air evacuation of the one or more cavities of the support substrate that are in contact with the portion of the wafer; and effecting relative movement of the platform with respect to the support structure for alignment of the wafer with respect to a probe. - View Dependent Claims (14, 15, 16)
-
Specification