Exposure apparatus, and device manufacturing method

• US 8,436,978 B2
• Filed: 08/16/2007
• Issued: 05/07/2013
• Est. Priority Date: 06/19/2003
• Status: Expired due to Fees

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Ebihara, Akimitsu
• Primary Examiner(s): NGUYEN, HUNG
• Application Number:
  US11/889,733
• Publication Number:
  US 20080002166A1
• Time in Patent Office: 2,091 Days
• Field of Search: 355/30, 355/53, 355/55, 355 67- 71, 250/548
• US Class Current: 355/53
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: G03F 7/70225 Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
• CPC Class Codes: G03F 7/70325 Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses
• CPC Class Codes: G03F 7/70333 Focus drilling, i.e. increase in depth of focus for exposure by modulating focus during exposure [FLEX]
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/70725 control
• CPC Class Codes: G03F 7/70733 Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
• CPC Class Codes: G03F 7/70758 Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
• CPC Class Codes: G03F 7/70816 Bearings
• CPC Class Codes: Y10T 29/49826 Assembling or joining

Abstract

A liquid immersion exposure apparatus includes an optical element through which an exposure beam passes, a first table which is movable relative to the optical element, while holding a substrate and a second table which is movable relative to the optical element while holding a substrate. The optical element is kept in contact with an exposure liquid while the first table and the second table are moved from a first state in which the first table is opposite to the optical element to a second state in which the second table is opposite to the optical element.

Claims

1. A liquid immersion exposure apparatus comprising:

an optical element through which an exposure beam passes;

a first table which is movable relative to the optical element, while holding a substrate;

a second table which is movable relative to the optical element while holding a substrate; and

a controller that controls the first and second tables to move so that the optical element is kept in contact with an exposure liquid while the first table and the second table are moved from a first state in which the first table is opposite to the optical element to a second state in which the second table is opposite to the optical element,

wherein the controller controls the tables to move from the first state to the second state, while the tables are close together or in contact with each other.

2. The apparatus according to claim 1, further comprising:

a liquid supply system having a supply outlet, which supplies the exposure liquid.

3. The apparatus according to claim 1, wherein the controller controls the tables to move from the first state to the second state, while the exposure liquid is retained between at least one of the tables and the optical element such that the optical element is kept in contact with the exposure liquid.

4. The apparatus according to claim 3, wherein the controller controls the tables to move from the first state to the second state, while the tables are close together or in contact with each other along opposing sides of the tables extending in a first direction.

5. The apparatus according to claim 4, wherein the controller controls the tables to move in a second direction orthogonal to the first direction from the first state to the second state.

6. The apparatus according to claim 5, further comprising:

an alignment system that detects alignment marks on a substrate, wherein

the optical element and the alignment system are located apart from each other in the second direction.

7. The apparatus according to claim 6, further comprising:

a stage system including a first linear motor member which extends along the second direction, a second linear motor member which is movable along the first linear motor member, and a third linear motor member which extends along the first direction and which is connected to the second linear motor member, the second table being moved by the stage system while alignment marks of the substrate held by the second table are detected by the alignment system.

12. The apparatus according to claim 1, further comprising a liquid containment member including a surface, wherein at least one of the tables is opposite to the surface of the liquid containment member, while the tables are moved from the first state to the second state.

13. The apparatus according to claim 12, wherein each of the first and second tables has a mount area and a surface of an area surrounding the mount area, and wherein the surface is substantially flush to the surface of the substrate held on the mount area when the surface is opposite to the surface of the containment member.

14. The apparatus according to claim 12, wherein the controller controls the tables to move from the first state to the second state, while the exposure liquid is retained between at least one of the tables and the optical element.

15. The apparatus according to claim 12, wherein the controller controls the tables to move from the first state to the second state, while maintaining a state in which the tables are close together or in contact with each other such that the optical element is kept in contact with the exposure liquid.

16. The apparatus according to claim 15, wherein the controller controls the tables to move from the first state to the second state, while the tables are close together or in contact with each other along opposing sides of the tables extending in a first direction.

17. The apparatus according to claim 16, wherein the controller controls the tables to move in a second direction orthogonal to the first direction from the first state to the second state.

18. The apparatus according to claim 17, further comprising:

an alignment system that detects alignment marks on a substrate, wherein

the optical element and the alignment system are located apart from each other in the second direction.

19. The apparatus according to claim 12, wherein the controller controls the tables to move from the first state to the second state, while at least one of the tables is positioned below the optical element such that the optical element is kept in contact with the exposure liquid.

20. A device manufacturing method comprising:

exposing a substrate by using a liquid immersion exposure apparatus as defined in claim 1; and

developing the exposed substrate.

8. A liquid immersion exposure apparatus comprising:

an optical element through which an exposure beam passes;

a first table which is movable relative to the optical element, while holding a substrate;

a second table which is movable relative to the optical element while holding a substrate; and

a controller that controls the first and second tables to move so that the optical element is kept in contact with an exposure liquid while the first table and the second table are moved from a first state in which the first table is opposite to the optical element to a second state in which the second table is opposite to the optical element,

wherein the controller controls the tables to move from the first state to the second state, while at least one of the tables is positioned below the optical element such that the optical element is kept in contact with the exposure liquid, and while the tables are close together or in contact with each other.

9. The apparatus according to claim 8, wherein the controller controls the tables to move from the first state to the second state, while the tables are close together or in contact with each other along opposing sides of the tables extending in a first direction.

10. The apparatus according to claim 9, wherein the controller controls the tables to move in a second direction orthogonal to the first direction from the first state to the second state.

11. The apparatus according to claim 10, further comprising:

an alignment system that detects alignment marks on a substrate, wherein

the optical element and the alignment system are located apart from each other in the second direction.

21. A liquid immersion system comprising:

an optical element through which an exposure beam passes;

a first table that is capable of moving while holding a substrate;

a second table that is capable of moving while holding a substrate; and

a controller that controls the first and second tables to move from a first state to a second state so that, below the optical element, a liquid is maintained in contact with the optical element while one of the first and second tables is being replaced by the other of the first and second tables,

wherein the controller controls the tables to move from the first state to the second state, while the tables are close together or in contact with each other.

22. A liquid immersion system comprising:

a projection system through which an exposure beam passes;

a first table that is capable of moving while holding a substrate;

a second table that is capable of moving while holding a substrate; and

a controller that controls the first and second tables to move from a first state to a second state so that a liquid is maintained in contact with the projection system while one substrate is being exchanged for another substrate below the projection system,

wherein the controller controls the tables to move from the first state to the second state, while the tables are close together or in contact with each other.

23. A liquid immersion exposure apparatus comprising:

an optical element through which an exposure beam passes;

a first table which is movable relative to the optical element, while holding a substrate;

a second table which is movable relative to the optical element while holding a substrate; and

control means for controlling the first and second tables to move from a first state to a second state so that at least one of the first and second tables is positioned below the optical element to maintain a liquid in contact with the optical element while one of the first and second tables is being replaced by the other of the first and second tables below the optical element, wherein the control means controls the tables to move from the first state to the second state, while the tables are close together or in contact with each other.