Optical system, exposure system, and exposure method
First Claim
1. An optical system including an illumination optical system which illuminates a surface to be illuminated, the optical system comprising:
- a birefringent element, disposed in an optical path of the optical system and including an optically transparent member which is made of uniaxial crystal material and crystallographic axis of which is arranged substantially in parallel with an optical axis of the optical system, that achieves a substantially circumferential distribution or a substantially radial distribution as a fast axis distribution in a lens aperture, the birefringent element is located at or near a position optically conjugate with the surface to be illuminated, in an optical path of the illumination optical system; and
an optical rotator disposed on an image side of the birefringent element and adapted to rotate a polarization state in the lens aperture,wherein a beam bundle in a substantially circular polarization state is incident to the optically transparent member.
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Accused Products
Abstract
An optical system is able to achieve a substantially azimuthal polarization state in a lens aperture while suppressing loss of light quantity, based on a simple configuration. The optical system of the present invention is provided with a birefringent element for achieving a substantially circumferential distribution or a substantially radial distribution as a fast axis distribution in a lens aperture, and an optical rotator located behind the birefringent element and adapted to rotate a polarization state in the lens aperture. The birefringent element has an optically transparent member which is made of a uniaxial crystal material and a crystallographic axis of which is arranged substantially in parallel with an optical axis of the optical system. A light beam of substantially spherical waves in a substantially circular polarization state is incident to the optically transparent member.
157 Citations
36 Claims
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1. An optical system including an illumination optical system which illuminates a surface to be illuminated, the optical system comprising:
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a birefringent element, disposed in an optical path of the optical system and including an optically transparent member which is made of uniaxial crystal material and crystallographic axis of which is arranged substantially in parallel with an optical axis of the optical system, that achieves a substantially circumferential distribution or a substantially radial distribution as a fast axis distribution in a lens aperture, the birefringent element is located at or near a position optically conjugate with the surface to be illuminated, in an optical path of the illumination optical system; and an optical rotator disposed on an image side of the birefringent element and adapted to rotate a polarization state in the lens aperture, wherein a beam bundle in a substantially circular polarization state is incident to the optically transparent member. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. An exposure apparatus comprising:
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an optical system which includes an optically transparent member which is made of uniaxial crystal material and crystallographic axis of which is arranged substantially in parallel with an optical axis of the optical system, and effects exposure of a predetermined pattern on a photosensitive substrate and which includes an illumination optical system which illuminates the predetermined pattern, wherein the optical system comprises; a birefringent element which achieves a substantially circumferential distribution or a substantially radial distribution as a fast axis distribution in a lens aperture, and which is located at or near a position optically conjugate with the surface to be illuminated, in an optical path of the illumination optical system; and an optical rotator located on an image side of the birefringent element and adapted to rotate a polarization state in the lens aperture, wherein a beam bundle in a substantially circular polarization state in incident to the optically transparent member. - View Dependent Claims (20, 21, 22, 23, 24, 25, 26, 27)
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28. A device fabrication method comprising:
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preparing a photosensitive substrate; exposing a predetermined pattern to be transferred, on the photosensitive substrate through an optical system including an illumination optical system, the optical system comprises a birefringent element and an optical rotator, wherein the exposing comprises; achieving a substantially circumferential distribution or a substantially radial distribution as a fast axis distribution in a lens aperture by the birefringent element; and rotating a polarization state in the lens aperture being a polarization state of a beam bundle including having passed through the birefringent element, by the optical rotator; and illuminating the predetermined pattern through the optical system, wherein in achieving the substantially circumferential distribution or a substantially radial distribution, a beam bundle in a substantially circular polarization state is incident to a transparent optical member which is made of uniaxial crystal material and crystallographic axis of which is arranged substantially in parallel with an optical axis of the optical system; and wherein the birefringent element is located at or near a position optically conjugate with the predetermined pattern surface, on an optical path of the illumination optical system. - View Dependent Claims (29, 30, 31, 32, 33, 34, 35)
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36. An optical system including an illumination optical system which illuminates a surface to be illuminated, the optical system comprising:
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a birefringent element, disposed in an optical system, that achieves a substantially circumferential distribution or a substantially radial distribution as a fast axis distribution in a lens aperture, the birefringent element is located at or near a position optically conjuate with the surface to be illuminated, in an optical path of the illumination optical system; and an optical rotator disposed on an image side of the birefringent element and adapted to rotate a polarization state in the lens aperture, wherein the optical rotor rotates the polarization state in the lens aperture by about 45°
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Specification